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Screen display precision improving method

A technology of screen display and precision, applied in the photoengraving process of the pattern surface, the original for opto-mechanical processing, optics, etc., can solve the problem of uneven brightness and so on

Pending Publication Date: 2020-07-17
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] An embodiment of the present invention provides a method for improving the accuracy of screen display. The first exposure mark pattern and the second exposure mark pattern are set on each layer of the mask, thereby improving the accuracy of the stitching area and avoiding uneven brightness and various visible problems such as traces

Method used

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Examples

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Embodiment Construction

[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0036] An embodiment of the present invention provides a method for improving the accuracy of screen display. The method can be applied and practiced on a Nikon array exposure machine.

[0037] For example, if image 3 As shown, a plurality of photomasks are used to expose the deposition layer corresponding to each photomask multiple times. Two types of exposure area patterns are included on the photomask. The size of the first exposure area pattern is 32 inches, which...

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Abstract

The embodiment of the invention provides a screen display precision improving method. The method is characterized by setting at least one first exposure mark pattern and at least one second exposure mark pattern on each layer of photomask; sequentially exposing the deposition layer by using each layer photomask to form a first exposure mark, a second exposure mark and an exposure area; obtaining relative offset between the first exposure mark and the second exposure mark, and adjusting the parameters of the exposure area, thereby improving the precision of the splicing area, and avoiding the problems of uneven brightness and various visible traces.

Description

technical field [0001] The invention relates to the technical field of screen display, in particular to a method for improving the accuracy of screen display. Background technique [0002] With the improvement of people's living standards, combined with people's daily needs, LCD panels are developing towards large-size and high-definition trends. Among them, the array exposure production line has become a bottleneck in the production capacity and quality of large-scale high-definition products. After using the array exposure machine to complete the panel display When the array exposure opportunity is limited by the model, it is necessary to use the splicing function when producing products with large-size screens, such as figure 1 As shown, the small-sized exposure area pattern on the mask is exposed twice or even multiple times to form the first exposure area and the second exposure area, which are spliced ​​and combined on the large-size glass substrate to form a complete ...

Claims

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Application Information

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IPC IPC(8): G03F1/42G03F9/00
CPCG03F1/42G03F9/00
Inventor 张伟刘易朋侯蒙召唐少博
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD