Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for evaluating the self-healing limit of polymer-based self-healing membranes

A self-healing, polymer technology, applied in the direction of instruments, measuring devices, scientific instruments, etc., can solve the problem that there is no way to give the limit of self-healing

Active Publication Date: 2022-04-15
JIAXING UNIV
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method can only qualitatively study the self-healing of materials, and there is no way to give a specific self-healing limit, such as how many times the damage / repair can no longer be self-healing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for evaluating the self-healing limit of polymer-based self-healing membranes
  • A method for evaluating the self-healing limit of polymer-based self-healing membranes
  • A method for evaluating the self-healing limit of polymer-based self-healing membranes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] A method for evaluating the self-healing limit of a polymer-based self-healing membrane, the specific steps are as follows:

[0044] (1) Pretreatment: Place silica microspheres with a diameter of 800nm ​​hexagonal close-packed on the surface of a branched polyvinylimine and polyacrylic acid multilayer film (thickness of the film is 20 μm, and placed on a silicon substrate) ; The silicon dioxide microspheres are etched by plasma etching technology until they are non-closely packed silicon dioxide microspheres with a diameter of 500nm, and the gap between adjacent microspheres is 300nm;

[0045] (2) Etching: the film after step (1) is etched by plasma etching technology to form a specific crack structure (micro-nano column array structure, the diameter of the micro-nano column is 500nm, and the depth is 6 μm); Then, the silica microspheres on the membrane were removed with hydrofluoric acid;

[0046] (3) Self-repair: place the membrane treated in step (2) in deionized wa...

Embodiment 2

[0052] A method for evaluating the self-healing limit of a polymer-based self-healing membrane, the specific steps are as follows:

[0053] (1) Pretreatment: Place silica microspheres with a diameter of 500nm hexagonal close-packed on the surface of a branched polyvinylimmonium and polylactic acid multilayer film (thickness of the film is 15 μm, and placed on a quartz substrate); The silicon dioxide microspheres are etched by plasma etching technology until they are non-closely packed silicon dioxide microspheres with a diameter of 300nm, and the gap between adjacent microspheres is 200nm;

[0054] (2) Etching: Etching the film treated in step (1) using plasma etching technology to form a specific crack structure (micro-nano column array structure, the diameter of the micro-nano column is 300nm, and the depth is 3 μm); Then, the silica microspheres on the membrane were removed with hydrofluoric acid;

[0055] (3) Self-repair: place the membrane treated in step (2) in deionize...

Embodiment 3

[0062] A method for evaluating the self-healing limit of a polymer-based self-healing membrane, the specific steps are as follows:

[0063] (1) Pretreatment: Place hexagonal close-packed polystyrene microspheres with a diameter of 5 μm on the surface of polyvinyl alcohol and polyacrylic acid self-healing hydrogel electrolyte membrane (thickness of the membrane is 35 μm);

[0064] (2) Etching: the film after step (1) is etched by plasma etching technology to form a specific crack structure (micro-nano cone array structure, the bottom diameter of the micro-nano cone is 5 μm, and the depth is 4.8 μm) ); Since polystyrene is a polymer, it is etched during the etching polymer process;

[0065] (3) Self-repair: place the membrane treated in step (2) in deionized water at a temperature of 22°C for 30 minutes;

[0066] (4) Measurement: the upper surface roughness value D of the film after the treatment step (3) is measured by an atomic force microscope of JPK instrument AG, Berlin, G...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
depthaaaaaaaaaa
depthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for evaluating the self-healing limit of a polymer-based self-healing membrane. The polymer-based self-healing membrane is cyclically etched-self-healed-measured until the measurement result exceeds the specified limit; the number of cycles N is recorded as The self-healing limit of the polymer-based self-healing film; the measurement result exceeding the specified means that the upper surface roughness D of the polymer-based self-healing film after self-healing is greater than the threshold value K or the crack morphology has obvious cracks visually: the said The crack structure is composed of multiple identical cracks with a certain spacing, and the size of each crack is represented by diameter and depth or width and depth; the specific crack structure refers to the diameter, width or depth of each crack being greater than or equal to 100nm . The method of the present invention can accurately prepare cracks of controllable size, thereby ensuring the standardization of the method; multiple times of repeated damage / healing of cracks in the same sample and in the same area can be used to evaluate its self-repair limit.

Description

technical field [0001] The invention belongs to the technical field of composite material evaluation, and relates to a method for evaluating the self-repair limit of a polymer-based self-repair membrane. Background technique [0002] Polymer matrix composites with self-healing function can imitate the self-healing mechanism of biological damage to process materials or self-repair microscopic cracks that are difficult to find with the naked eye during use. The application range of self-healing materials is extremely wide, including military equipment, electronic products, automobiles, aircraft, construction materials and other fields, among which the application on the screen of smartphones and tablet computers has attracted the most attention. Current studies have explored the self-healing process of polymer-based composites, but there is little research on the self-healing limit of polymer-based self-healing membranes. However, many current application fields need to know ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01Q60/24G01N23/225
CPCG01Q60/24G01N23/225G01N2223/102G01N2223/61G01N2223/634G01N2223/6462
Inventor 陈洪旭李海东程凤梅林祥松陈超
Owner JIAXING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com