A quantum chip test structure, its preparation method and test method
A chip testing and quantum technology, applied in the quantum field, can solve the problems of structure sensitivity, abnormal actual function junction, and failure to adopt, and achieve the effect of easy preparation and easy acquisition
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Embodiment 1
[0072] Embodiment 1 of the present invention provides a quantum chip test structure. The implementation details of this embodiment are described in detail below, and the following content is only implementation details provided for easy understanding, and is not necessary for implementing this solution. The schematic diagram of this embodiment can refer to figure 1 ,include:
[0073] a superconducting Josephson junction 20 on the substrate 10; and
[0074] A conductive film layer 30 located on the superconducting Josephson junction, the conductive film layer 30 is used to realize electrical contact with the probe and protect the superconducting Josephson junction.
[0075] In an option of this embodiment, the conductive film layer 30 includes a mixture layer of photoresist and graphite.
[0076] In an option of this embodiment, the conductive film layer 30 includes an organic semiconductor material layer.
[0077] In an option of this embodiment, the conductive film layer ...
Embodiment 2
[0081] Embodiment 2 of the present invention provides a quantum chip test structure, which can be further optimized on the basis of Embodiment 1, wherein the description of the same or similar parts is omitted. The implementation details of this embodiment are described in detail below, and the following content is only implementation details provided for easy understanding, and is not necessary for implementing this solution. The schematic diagram of this embodiment can refer to figure 1 ,include:
[0082] In an option of this embodiment, the conductive film layer 30 includes a mixture layer of photoresist and graphite.
[0083] In another option of this embodiment, the conductive film layer 30 includes an organic semiconductor material layer, for example, it may be P3HT (poly-3 hexylthiophene).
[0084] In another option of this embodiment, the conductive film layer 30 includes a metal layer that is less resistant to chemical corrosion than the metal material covered by th...
Embodiment 3
[0092]Embodiment 3 of the present invention provides a quantum chip test structure, and can be further optimized on the basis of Embodiment 1 or Embodiment 2. This embodiment is similar to the part of Embodiment 1 or Embodiment 2, wherein, the same or similar parts to omit their descriptions. The implementation details of this embodiment that are different from those of Embodiment 1 or Embodiment 2 will be specifically described below. The following content is only implementation details provided for easy understanding, and is not necessary for implementing this solution. The schematic diagram of this embodiment can refer to figure 1 ,include:
[0093] In this embodiment, considering that the area of some three-layer overlapping superconducting Josephson junctions is small, for example, the length and width are about 200nm, and the size (for example, diameter) of the probe is about several microns. Next, if the conductive film layer 30 is disposed on the superconducting Jo...
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Abstract
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