Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A high-efficiency polishing cleaning machine based on button production

A high-efficiency cleaning machine technology, which is applied to surface polishing machine tools, machine tools suitable for grinding the edge of workpieces, grinding/polishing equipment, etc., can solve problems such as cumbersome procedures, simplify procedures, facilitate cleaning, and improve bearing capacity. The effect of power

Active Publication Date: 2022-02-18
福建龙康尚品工业设计有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] After the buttons are processed, they need to be polished and cleaned. The abrasives are put into the polishing barrel of the polishing machine. After the polishing is completed, the buttons and the abrasives are taken out from the polishing machine, and then the buttons are separated from the abrasives, but the surface of the buttons will still adhere. A small amount of abrasive, so the buttons need to be cleaned, and the process is relatively cumbersome

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A high-efficiency polishing cleaning machine based on button production
  • A high-efficiency polishing cleaning machine based on button production
  • A high-efficiency polishing cleaning machine based on button production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] see Figure 1-Figure 5 As shown, the present invention provides a high-efficiency polishing cleaning machine based on button production, including a support frame 1, an outer cylinder 2 is installed on the support frame 1, and a rotating shaft 3 is movable in the outer cylinder 2, and a rotating shaft 3 is installed There is a polishing cylinder 4 located in the outer cylinder body 2, the polishing cylinder 4 is rotated relative to the outer cylinder body 2, the polishing cylinder 4 includes an annular filter 41, and the two ends of the annular filter 41 are respectively provided with sleeves installed on the rotating shaft 3 The sealing plate 42, the annular filter screen 41 is provided with an annular baffle 43, the distance between the annular baffle 43 and the outer cylinder 2 is set, the annular baffle 43 and the sealing plate 42 are slidably connected and sealed, and the outer cylinder 2 There is a water inlet pipe 5 connected to the external water supply equipmen...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high-efficiency polishing cleaning machine based on button production, which includes a support frame, an outer cylinder body is installed on the support frame, a rotating shaft is movable in the outer cylinder body, and a polishing cylinder located in the outer cylinder body is installed on the rotation shaft. The outer cylinder is rotated, and the polishing cylinder includes an annular filter. The two ends of the annular filter are respectively provided with sealing plates sleeved on the rotating shaft. The outer shell of the annular filter is provided with an annular baffle. The distance between the ring baffle and the sealing plate is slidably connected and sealed. There is a water inlet pipe on the outer cylinder. The end part of the water inlet pipe is inserted into the outer cylinder and is equipped with an atomizing nozzle. In addition, the sealing plate is provided with a feed port and a discharge port. Abrasives and buttons are added to the rotatable polishing cylinder through the feeding port. After the polishing is completed, the annular baffle is removed, and the atomizing nozzle cleans the buttons in the annular filter. The abrasive flows out of the filter during rotation.

Description

technical field [0001] The invention relates to the technical field of button polishing equipment, in particular to a high-efficiency polishing cleaning machine based on button production. Background technique [0002] Buttons are things that people often come into contact with in daily life. By opening buttonholes on one side of the clothes and sewing buttons on the other side of the clothes, the clothes can be fastened. The original function was to connect the plackets of clothes, but now it has gradually developed to be more artistic and decorative in addition to maintaining its original function, which can make the clothes more perfect and play a beautiful role. [0003] After the buttons are processed, they need to be polished and cleaned. The abrasives are put into the polishing barrel of the polishing machine. After the polishing is completed, the buttons and the abrasives are taken out from the polishing machine, and then the buttons are separated from the abrasives,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B24B31/02B24B31/10B24B31/16
CPCB24B31/02B24B31/10B24B31/16
Inventor 刘志康
Owner 福建龙康尚品工业设计有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com