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Model generation method and device, electronic equipment and storage medium

A model generation and model technology, applied in the field of face detection with masks, can solve the problems of lack of pertinence in mask scenes, difficult to meet real-time face recognition with masks, limited face recognition capabilities, etc., so as to reduce the consumption of computing resources. Effect

Pending Publication Date: 2020-10-09
BEIJING BAIDU NETCOM SCI & TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In related technologies, face recognition models are widely used. However, traditional face recognition models cannot solve face recognition in mask-wearing scenes. The model's ability to recognize faces in mask-wearing scenes is limited
In order to improve the model's ability to recognize faces in masked scenes, a particularly large model structure is required, but it is difficult to meet the needs of real-time masked face recognition with a very large model

Method used

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  • Model generation method and device, electronic equipment and storage medium
  • Model generation method and device, electronic equipment and storage medium
  • Model generation method and device, electronic equipment and storage medium

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Embodiment Construction

[0025] Exemplary embodiments of the present application are described below in conjunction with the accompanying drawings, which include various details of the embodiments of the present application to facilitate understanding, and they should be regarded as exemplary only. Accordingly, those of ordinary skill in the art will recognize that various changes and modifications of the embodiments described herein can be made without departing from the scope and spirit of the application. Also, descriptions of well-known functions and constructions are omitted in the following description for clarity and conciseness.

[0026] The embodiment of the present application provides a model generation method, such as figure 1 shown, including:

[0027] S101: Acquire a first model and a second model to be trained; wherein, the first model is a model with fixed parameters; the network complexity of the second model to be trained is lower than that of the first model;

[0028] S102: Perfor...

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Abstract

The invention discloses a model generation method and device, electronic equipment and a storage medium, relates to the field of deep learning, cloud computing and computer vision in artificial intelligence, and specifically relates to the field of mask wearing face detection. The method concretely comprises the following steps: acquiring a first model and a to-be-trained second model, wherein thenetwork complexity of the to-be-trained second model is lower than that of the first model; performing multiple times of first iteration processing based on the first model and the to-be-trained second model to obtain a second model; and performing quantization processing on the second model to obtain a target model.

Description

technical field [0001] This application relates to the field of computer technology. This application particularly relates to the fields of deep learning, cloud computing and computer vision in artificial intelligence, and is specifically used in the detection of faces wearing masks. Background technique [0002] In related technologies, face recognition models are widely used. However, traditional face recognition models cannot solve face recognition in mask-wearing scenes. The model's ability to recognize faces in mask-wearing scenes is limited. In order to improve the model's ability to recognize faces in masked scenes, a particularly large model structure is required, but a very large model is difficult to meet the needs of real-time masked face recognition. Therefore, how to make the processing of the model meet both real-time requirements and certain accuracy requirements has become a problem to be solved. Contents of the invention [0003] The disclosure provides...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06K9/00G06N3/04G06N3/08G06F21/32
CPCG06N3/08G06F21/32G06V40/171G06V40/172G06N3/045
Inventor 希滕张刚温圣召
Owner BEIJING BAIDU NETCOM SCI & TECH CO LTD
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