A method for producing high-temperature superconducting strips by ex-situ deposition of multi-source ion injection sources
A technology of high-temperature superconducting strips and spray sources, which is applied in the usage of superconducting elements, superconducting devices, superconducting/high-conducting conductors, etc., which can solve the problem of inability to accurately control the composition of the film, difficulty in controlling the uniformity of the coating, and process equipment. High cost and other issues, to achieve the effect of improving coating efficiency, improving production efficiency, and fast growth rate
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2021-09-21
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Abstract
Description
Technical field
[0001] The present invention belongs to the preparation process of superconducting strip, and more particularly to a method of non-in situ deposition of non-in-situ deposition to produce high-temperature superconducting strips, and more particularly to a multi-source ion injection source non-in situ deposition production Process method of secondary high temperature superconducting strip. Background technique
[0002] In 1911, the superconducting phenomenon was first discovered. In these more than 100 years, the type of superconducting material was constantly rich through the continuous efforts of countless scientists. Especially in the past 20 years, the development of superconducting materials has made great progress. Widely used in the fields of medical nuclear magnetic, nuclear fusion, superconducting cables and superconducting fluids. The second-generation high-temperature superconducting strip represented by Rebco, as high critical transition temperatures and...
Examples
Embodiment 1
[0033]A method of producing high-temperature superconducting strips with a multi-source ion injection source is a method of producing high-temperature superconducting strips, which is the following steps:
[0034] A. In the deposition cavity, the biaxially woven layer strip is adjacent to the target, and the number of ion guns in the multi-source ion spray is 6, and the target bombards the target to form a plasma. Well, so that the pre-drive film is formed in a mixture of a metal oxide on a buffer layer.
[0035] Among them, the buffer layer strip is a nickel group or a copper-based alloy, and the present embodiment selects a nickel-based alloy; the surface of the buffer layer is plated with CEO. 2 / Lamno 3 / MGO / Y 2 O 3 The target is GD 2 O 3 BA 2 CO 3 The uniform mixed target of three metal oxides in CuO, wherein the atomic ratios of the three elements of GD, BA, and Cu are 1: 2: 3.
[0036] The distance between the six ion guns is 2 cm, the ion gun and the target distance ar...
Embodiment 2
[0039] A multi-source ion injection source is a method of producing high-temperature superconducting strips in situ, which is an example of the preparation process of YGDBCO second-generation high temperature superconducting strip, including the following steps:
[0040] A. In the deposition cavity, the biaxially woven layer strip is adjacent to the target, and the number of ion guns in the multi-source ion spray is 6, and the target bombards the target to form a plasma. Well, so that the pre-drive film is formed in a mixture of a metal oxide on a buffer layer.
[0041] The buffer layer strip is a nickel group or a copper-based alloy, and the present embodiment selects a copper-based alloy; the surface of the buffer layer is plated with CEO. 2 / Lamno 3 / MGO / Y 2 O 3 The target is Y 2 O 3 GD 2 O 3 BA 2 CO 3 And the homogeneous mixture of four metal oxides, wherein the atomic ratio of Y, GD, Ba, and Cu is 0.5: 0.5: 2: 3.
[0042] The distance between the six ion guns is 2 cm, the...
Embodiment 3
[0046] A multi-source ion injection source is a method of producing high-temperature superconducting strips in situ deposits to contain BAZRO 3 The preparation process of doped GDBacuo second-generation high temperature superconducting strips includes the following steps:
[0047] A. In the deposition cavity, the biaxially woven buffer strip is adjacent to the target, and the number of ion guns in the multi-source ion ejection is 8, and the target bombards the target to form a plasma by 8 ion injection sources. Well, so that the pre-drive film is formed in a mixture of a metal oxide on a buffer layer.
[0048] Among them, the buffer layer strip is a nickel-based or copper-based alloy, and the present embodiment selects a copper-based alloy; the surface of the buffer layer is plated with CEO. 2 / Lamno 3 / MGO / Y 2 O 3 The target is GD 2 O 3 BA 2 CO 3 , Cuo and Bazro 3 A uniform mixing target of four metal oxides. Among them, the atomic ratios of the three elements of GD, BA, and ...