Method of preparing patterned polymer

A patterning and polymer technology, applied in the direction of photomechanical equipment, pattern surface photolithography, optics, etc., can solve problems such as high equipment and environmental requirements, difficult quality control, numerous microstructures, etc., to achieve operational The effect of low environmental requirements, stable production quality, and gentle separation process

Pending Publication Date: 2021-01-05
SHENZHEN CAREST TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the final stage of the inversion method, the patterned polymer needs to be carefully peeled off from the photoresist mold. There are many microstructures on the patter

Method used

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  • Method of preparing patterned polymer
  • Method of preparing patterned polymer

Examples

Experimental program
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Embodiment 1

[0053] Embodiment 1: A method for preparing a patterned polymer. The specific operation steps of this embodiment are as described in the above-mentioned steps S1, S2, S3, S4, S5, and S6, wherein the process parameters in each step are shown in Table 1 shown.

[0054] Table 1 embodiment 1-5 each process parameter data sheet

[0055]

[0056]

Embodiment 2

[0057] Embodiment 2: A method for preparing a patterned polymer. The difference between this embodiment and Embodiment 1 is that the process parameters in each step are different, and the specific parameters are shown in Table 1.

Embodiment 3

[0058] Embodiment 3: A method for preparing a patterned polymer. The difference between this embodiment and Embodiment 1 is that the process parameters in each step are different, and the specific parameters are shown in Table 1.

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Abstract

The invention discloses a method for preparing a patterned polymer, and relates to the technical field of micro-fluidic chips. The method comprises the following steps: S1, spraying a photoresist, S2,transferring a pattern, S3, developing with a developing solution, S4, coating a polymer, S5, dissolving the polymer, and S6, demolding the photoresist. According to the invention, the separation between the polymer and the patterned photoresist is converted into dissolution separation from traditional stripping, the separation process of the polymer and the patterned photoresist is gentler, thepatterned polymer structure is not easy to damage, the production quality is higher, the requirements on the operation difficulty, the equipment precision and the operation environment are lower, andthe production quality is more stable and the production is more efficient.

Description

technical field [0001] The invention relates to the technical field of microfluidic chips, in particular to a method for preparing patterned polymers. Background technique [0002] Microfluidic chip technology integrates the basic operation units such as sample preparation, reaction, separation, and detection in the process of biological, chemical, and medical analysis into a micron-scale chip to automatically complete the entire analysis process. Due to its great potential in the fields of biology, chemistry, and medicine, it has developed into a new research field interdisciplinary in biology, chemistry, medicine, fluid, electronics, materials, and machinery. Currently, microfluidic chips can be fabricated using materials such as glass, polymers, hydrogels, paper, etc., but the most common materials are polymers. Among them, silicones such as polydimethylsiloxane (PDMS) are widely used in polymers, and other types of polymers such as polymethyl methacrylate and polycarbon...

Claims

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Application Information

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IPC IPC(8): G03F7/00
CPCG03F7/0035G03F7/00
Inventor 李远航张行万明明邓杨臻李源
Owner SHENZHEN CAREST TECH CO LTD
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