Unlock instant, AI-driven research and patent intelligence for your innovation.

Display device and manufacturing method thereof

A technology of display device and manufacturing method, which is applied in identification devices, semiconductor/solid-state device manufacturing, instruments, etc., can solve the problems of discontinuous film layer, fracture, poor film quality, etc., and achieve the effect of good water and oxygen barrier performance

Active Publication Date: 2021-01-08
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When forming an inorganic film with a thin-film packaging structure on this cavity structure, there will be discontinuity in the film layer and poor film quality of the inorganic film due to the excessively large taper angle, for example, exceeding 80°. Prone to fracture (crack) and other failures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Display device and manufacturing method thereof
  • Display device and manufacturing method thereof
  • Display device and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029]The technical solutions in the present application will be described clearly and completely in conjunction with the drawings in the embodiments of the present application. Obviously, the described implementations are only a part of the implementations of this application, rather than all of the implementations. Based on the implementation manners in this application, all other implementation manners obtained by those skilled in the art without creative work fall within the protection scope of this application.

[0030]In the description of this application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " "Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise" and other directions or The positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a display device which comprises the components of: a flexible substrate which is provided with an undercut groove; and a display function layer which is arranged on the flexible substrate and comprises an organic light-emitting layer, wherein the organic light-emitting layer is disconnected at the groove, and an organic layer covers the inner side wall of the groove.

Description

Technical field[0001]This application relates to the field of display, and in particular to a display device and a manufacturing method thereof.Background technique[0002]In the known organic light emitting diode display device, in order to prevent water and oxygen from invading, a special structure is formed at certain positions of the display panel, which can make the organic light emitting layer discontinuous at the special position and the thin film packaging structure is continuous. One of the methods is to etch the display panel to form a cavity structure. However, the water and oxygen barrier properties of inorganic membranes are directly related to the morphology of the underlying membrane. When an inorganic film with a thin-film encapsulation structure is formed on this cavity structure, the taper angle is too large, for example, when it exceeds 80°, the inorganic film will have the problems of discontinuity and poor film quality, which leads to problems after the bending te...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L51/52H01L27/32G09F9/30
CPCG09F9/301H10K59/12H10K50/844H10K59/1201
Inventor 黄静
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD