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Swing apparatus, method for processing a substrate, swing module for receiving a substrate from a transfer chamber, and vacuum processing system

A technology for substrates and equipment, applied in the field of swing equipment and modules, can solve problems affecting reliability, affecting performance, etc.

Pending Publication Date: 2021-02-02
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This can cause issues with particles and uniformity due to glass mask alignment (shadowing effects) and side deposition on the fixture
Furthermore, deposition of particles generated in the processing chamber on components of the processing module external to the target substrate, such as on moving mechanical elements, can negatively affect the performance and thus reliability of said elements

Method used

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  • Swing apparatus, method for processing a substrate, swing module for receiving a substrate from a transfer chamber, and vacuum processing system
  • Swing apparatus, method for processing a substrate, swing module for receiving a substrate from a transfer chamber, and vacuum processing system
  • Swing apparatus, method for processing a substrate, swing module for receiving a substrate from a transfer chamber, and vacuum processing system

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Embodiment Construction

[0020] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the accompanying drawings. In the following description of the drawings, the same reference numerals denote the same components. Only differences with respect to individual embodiments are described. Each example is provided by way of explanation of the disclosure, and is not meant to be a limitation of the disclosure. Furthermore, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield a further embodiment. It is intended that this description cover such modifications and variations.

[0021] Unless otherwise specified, descriptions of a part or aspect in one embodiment are also applicable to corresponding parts or aspects in another embodiment.

[0022] Embodiments described herein may be used to inspect large area coated substrates, for example for fabricated dis...

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Abstract

A swing apparatus for moving a substrate relative to one or more deposition sources having a longitudinal axis is described. The swing apparatus includes a support body for holding the substrate; a rotation mechanism coupled to the support body for moving the substrate by an angle around a rotational axis to vary the substrate orientation from a transfer or horizontal orientation to a processing or vertical orientation at a processing area; and a linear motion mechanism coupled to the support body for translating the substrate relative to the longitudinal axis of the deposition source, when the substrate is in the processing orientation.

Description

technical field [0001] Embodiments of the present disclosure relate to oscillating apparatus and modules for moving a substrate relative to one or more deposition sources. Furthermore, embodiments of the present disclosure relate to methods and vacuum processing systems for processing substrates. Background technique [0002] Several methods are known for depositing materials on substrates. For example, the substrate may be coated by using an evaporation process, a physical vapor deposition (PVD) process (such as a sputtering process, a spraying process, etc.), or a chemical vapor deposition (CVD) process. The process may be carried out in a process chamber of a deposition apparatus in which the substrate to be coated is located. A deposition material is provided in the processing chamber. A layer of material, such as a layer of insulating material, may be deposited on the substrate using a sputter deposition process. This involves jetting material from a target onto a s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/68764H01L21/67718H01L21/67017H01L21/67207H01L21/02
Inventor 金庆泰洛克莎·雷迪佐木马·山木甘细川昭弘
Owner APPLIED MATERIALS INC