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A kind of basketless wafer cleaning method

A wafer and basket crystal technology, applied in the field of wafer cleaning equipment, can solve problems such as affecting the cleaning effect and blocking water flow, and achieve the effect of ensuring the cleaning effect

Active Publication Date: 2021-08-24
JIANGSU ASIA ELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Due to the blocking of the wafer box, the wafer box will inevitably block part of the water flow during spray cleaning, thus affecting the cleaning effect

Method used

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  • A kind of basketless wafer cleaning method
  • A kind of basketless wafer cleaning method
  • A kind of basketless wafer cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] This embodiment provides a basketless wafer cleaning device, such as figure 1 shown, including:

[0059] Horizontal conveying slide 1;

[0060] The basketless wafer grabbing manipulator 3 is used to grab the wafer 9 and drive the wafer 9 up and down under the action of the lifting mechanism 2;

[0061] The first cleaning tank 4, the second cleaning tank 5 and the third cleaning tank 6 arranged horizontally side by side;

[0062] The basketless wafer grabbing manipulator 3 is arranged on the horizontal transport slide 1, and can reach above any one of the first cleaning tank 4, the second cleaning tank 5 and the third cleaning tank 6;

[0063] The first cleaning tank 4, the second cleaning tank 5 and the third cleaning tank 6 all have a tank body 51 capable of accommodating wafers, and the top of the tank body 51 is provided with a first nozzle 53, and the tank body The bottom of 51 is provided with a wafer support frame 54;

[0064] The cleaning solution or clear wa...

Embodiment 2

[0088] This embodiment provides a method for cleaning a basket-free wafer, using the device of Embodiment 1, comprising the following steps:

[0089] S1: Grab the wafer 9 by the basketless wafer grasping manipulator 3 and drive the wafer 9 down into the tank body 51 of the cleaning tank;

[0090] S2: placing the wafer 9 on the wafer support frame 54 provided at the bottom inside the tank 51, and removing the basketless wafer grabbing robot 3;

[0091] S3: Open the first nozzle 53 provided on the top of the tank 51, so that the cleaning liquid or clear water sprayed from the nozzle on the first nozzle 53 is sprayed onto the peripheral surface of the wafer in the form of a parabola, and the water flow is absorbed by the wafer. Cut and flow to the front and back surfaces of the wafer;

[0092] S3A: After the first nozzle 53 stops spraying water, the cleaning liquid or clear water sprayed from the second nozzle 52 provided at the bottom of the first cleaning tank 4 is sprayed ont...

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PUM

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Abstract

This application relates to a method for cleaning wafers without baskets. Since the wafers are directly placed on the wafer support frame, the wafer is directly supported and fixed by the wafer support frame, eliminating the need for a wafer box. The cleaning liquid or clear water that can be ejected from the nozzle is sprayed onto the peripheral surface of the wafer in the form of a parabola. The water flow is cut by the wafer and flows to the front and rear surfaces of the wafer to directly clean the wafer, ensuring the cleaning effect.

Description

technical field [0001] The application belongs to the technical field of wafer cleaning equipment, and in particular relates to a basketless wafer cleaning method. Background technique [0002] Wafer refers to the silicon wafer used to make silicon semiconductor integrated circuits. The wafer manufacturing process is complex and has many processes. Different chemical materials are used in different processes, and impurities such as chemical agents, particles, and metals usually remain on the surface of the wafer. , so the wafer needs to be cleaned. When the wafer is cleaned, the wafer is usually connected to the wafer cassette and put into the wafer cleaning device for cleaning. [0003] Due to the blocking of the wafer box, the wafer box will inevitably block part of the water flow during spray cleaning, thereby affecting the cleaning effect. Contents of the invention [0004] The technical problem to be solved by the present invention is to provide a basketless wafer c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/02B08B3/04B08B13/00H01L21/67
CPCB08B3/02B08B3/04B08B13/00H01L21/67051H01L21/67057
Inventor 童建李刚钱诚
Owner JIANGSU ASIA ELECTRONICS TECH CO LTD