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Metrology apparatus

A kind of measurement equipment and branched technology, which is applied in the direction of optomechanical equipment, microlithography exposure equipment, measuring devices, etc.

Pending Publication Date: 2021-04-09
ASML NETHERLANDS BV
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Problems solved by technology

[0008] The intensity of the irradiation may be limited by the power of the radiation source and losses in the optical system of the measuring device

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Embodiment Construction

[0023] In this document, the terms "radiation" and "beam" are used to cover all types of electromagnetic radiation, including ultraviolet radiation (e.g. having a wavelength of 365nm, 248nm, 193nm, 157nm or wavelengths in the range of about 5-100 nm).

[0024] The terms "reticle", "mask" or "patterning device" as used herein may be interpreted broadly to refer to a general patterning device that may be used to impart a patterned cross-section to an incident radiation beam, The patterned cross-section corresponds to the pattern to be produced in the target portion of the substrate; the term "light valve" may also be used in this context. In addition to classical masks (transmissive or reflective; binary, phase-shifted, hybrid, etc.), examples of other such patterning devices include programmable mirror arrays and programmable LCD arrays.

[0025] figure 1 A lithographic apparatus LA is schematically depicted. The lithographic apparatus LA comprises: an illumination system (a...

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Abstract

A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European application 18192442.4 filed on September 4, 2018 and European application 19151907.3 filed on January 15, 2019, the entire contents of which are hereby incorporated by reference. technical field [0003] The invention relates to a metrology device for determining a parameter of interest of a structure on a substrate and a method for determining the parameter of interest. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern onto a substrate. For example, lithographic equipment may be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern (also often referred to as a "design layout" or "design") at a patterning device (e.g., a mask) onto a radiation-sensitive material (anti- etchant) layer. [0005] To project a pattern onto a substrate, a lithog...

Claims

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Application Information

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IPC IPC(8): G03F7/20G01N21/47G01N21/956
CPCG02F1/0136G02F1/33G01B2210/56G03F7/70616G01N21/956G01B11/2513G01N21/8806G01N21/47G01N2021/8816G01N2021/8848
Inventor M·J·M·范达姆A·J·登鲍埃夫N·潘迪
Owner ASML NETHERLANDS BV
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