Thermo-optical phase shifter and preparation method thereof
An optical phase shifter and phase shifter technology, applied in the semiconductor field, can solve problems such as low phase shifting rate, and achieve the effects of reducing overall resistance, increasing phase shifting speed, and improving design dimensions
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[0092] Correspondingly, this embodiment also provides a preparation method of a thermo-optic phase shifter, the preparation method comprising:
[0093] providing a semiconductor substrate 101;
[0094] Forming a propagation waveguide 102 and at least one doped resistance line 104 in the semiconductor substrate 101, wherein the doped resistance line 104 is located on at least one side of the propagation waveguide 102;
[0095] forming a first insulating layer 105 on the upper surface of the semiconductor substrate 101, the surface of the propagation waveguide 102, and the surface of the doped resistance line 104;
[0096] Forming at least one metal resistance line 106 on the upper surface of the first insulating layer 105, wherein the projections of the metal resistance line 106 and the doped resistance line 104 in the vertical direction do not overlap;
[0097] Forming a second insulating layer 107 on the upper surface of the first insulating layer 105 and the surface of the ...
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