Supercharge Your Innovation With Domain-Expert AI Agents!

A component cleaning device and method

A technology for cleaning devices and components, applied in cleaning methods and utensils, cleaning methods using gas flow, chemical instruments and methods, etc., can solve the problem that the cleaning station is far away from the final assembly area, the process of cleaning-transfer-assembly is cumbersome, Not suitable for large-scale production and other problems, to avoid large-scale turbulence, facilitate assembly, and reduce the spread of dust

Active Publication Date: 2021-06-11
SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The current solution is to set up a specific cleaning station, and then transfer to the final assembly area after the components are cleaned. The disadvantage of this method is that the cleaning station is far away from the final assembly area, and the components are prone to secondary pollution during the transfer process. , and the cleaning-transfer-assembly process is cumbersome and not suitable for large-scale production
[0003] In addition, in the standard high-pressure gas cleaning process in the prior art, technical workers need to hold an ion air gun to clean the components held by the other, and need to observe the readings of the particle counter at the same time. The entire process is inefficient and prone to crossover. Pollution

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A component cleaning device and method
  • A component cleaning device and method
  • A component cleaning device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] like figure 1 As shown, the embodiment of the present invention provides a component cleaning device, which is used in an ultra-clean room with a cleanliness level above IOS4 to clean a component to be cleaned. There is a clean air flow blown from top to bottom in the ultra-clean room. It also has a return air floor 21 including ventilation holes 211. Below the return air floor 21 is a return air layer. Under the action of the ventilation system in the ultra-clean room, the air entering the return air layer is filtered by the fan on the top of the ultra-clean room again. unit, thereby generating a downward direction of clean air flow, the process can be found in "A review of cleanroom microflora: types, trends, and patterns". PDA J Pharm Sci Technol . 65(4): 392–403. The component cleaning device includes a high-pressure injection assembly, an air duct 8 and an air extraction filter assembly, wherein the high-pressure injection assembly is located above the air return...

Embodiment 2

[0047] This embodiment provides a component cleaning method, comprising the following steps:

[0048] Step S1: Build the component cleaning device described in Example 1. By moving the bracket 5, the ion air gun 3 and the air duct inlet 8-4 of the horizontal section 8-2 are on the same horizontal plane with a distance of 30 cm. The nozzle of the ion air gun 3 Directly facing the air duct inlet 8-4 of the horizontal section 8-2.

[0049] The distance between the ion air gun 3 and the air duct inlet 8-4 can also be set to be less than 30cm, such as 20cm, which can also achieve better results.

[0050] Step S2: According to the structure of the component to be cleaned 7, set the air pressure and air volume of the nitrogen sprayed by the ion air gun 3, and set the sensing distance range of the position sensor 4.

[0051] For example, when the element 7 to be cleaned is an M8 stud with a length of 50 centimeters, the wind pressure can be set to 5 kg / cm2, the air volume is 800 stan...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a component cleaning device and method. The device is located in an ultra-clean room, including: a high-pressure spray assembly, located above the return air floor of the ultra-clean room, including interconnected ion air guns and high-pressure gas cylinders; an air duct, It has an air duct inlet and an air duct outlet. The air duct inlet and the ion air gun are located on the same horizontal plane and coaxially facing each other. The air duct outlet is located under the return air floor; at least one particle counter is located in the air duct; the air extraction filter assembly includes The filter fan box is located below the outlet of the air duct. The filter fan box has an air inlet and an air outlet. The component cleaning device and method of the present invention can avoid the generation of large-scale turbulent flow and reduce the diffusion of fine dust by setting a baffle plate at the inlet of the air duct; by setting a controller, the automation of the entire cleaning process can be realized and the cleaning efficiency can be improved.

Description

technical field [0001] The invention relates to the field of dust-free processing and manufacturing, and more particularly relates to a component cleaning device and method. Background technique [0002] Dust-free manufacturing has strict cleanliness requirements for the processing environment. For example, the IOS4 (FED STD 209E) cleanliness standard requires that the number of particles larger than 0.1 microns in the environment is less than 10,000 per cubic meter. In some applications, For example, in biomedicine, high-end equipment manufacturing, semiconductor industry, and high-energy particle accelerators, tens of thousands of components need to be assembled in a clean environment, so it is particularly important to clean and dust each component before final assembly. At present, the commonly used method is to use the high-pressure airflow with positive and negative charges ejected by the ion air gun to remove the dust and static electricity on the surface of the compo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B08B5/02B08B7/00B08B13/00
Inventor 赵烨梁胡晓
Owner SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com