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OVD process adjustable deposition system and adjusting method thereof

A technology of deposition system and adjustment method, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of inconsistent deposition quality and more investment, so as to improve the uniformity of geometric size and the stability of gas flow direction , the effect of stable cleanliness

Active Publication Date: 2021-05-14
TENGCANG FENGHUO PHOTOELECTRIC MATERIAL TECH CO LTD
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Problems solved by technology

[0005] Aiming at the defects existing in the prior art, the object of the present invention is to provide an OVD process adjustable deposition system and its adjustment method, which can solve the problem of needing to invest more reaction gas and raw materials in the initial stage of deposition in the prior art, and the resulting Problems with inconsistent deposition quality throughout the cycle

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  • OVD process adjustable deposition system and adjusting method thereof
  • OVD process adjustable deposition system and adjusting method thereof
  • OVD process adjustable deposition system and adjusting method thereof

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Embodiment Construction

[0028] In order to make the purposes, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments It is a part of the embodiments of this application, but not all of them. Based on the embodiments in the present application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present application.

[0029] Embodiments of the present invention will be described in further detail below in conjunction with the accompanying drawings.

[0030] figure 1 It is a schematic structural diagram of the OVD process adjustable deposition system in the embodiment of the present invention, such as figure 1 As shown, the present invention provide...

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Abstract

The invention relates to the technical field of optical fiber preform manufacturing, in particular to an OVD process adjustable deposition system and an adjusting method thereof. The system comprises two groups cavity plate assemblies, a deposition rate monitoring device and a control device, wherein the two groups of cavity plate assemblies form a cavity which is provided with an air inlet side and an air outlet side and is used for depositing an optical fiber preform, each group of cavity plate assembly comprises at least two rotationally connected cavity plates, angles of the cavity plates can be adjusted along with the deposition of the optical fiber preform, the deposition rate monitoring device is used for monitoring a deposition rate of the optical fiber preform, and the control device is used for adjusting the angle of the cavity plates according to an obtained deposition rate so as to adjust residual space of the cavity. According to the scheme, the problems that in the prior art, more reaction gas and raw materials need to be input in an initial stage of deposition, and the deposition quality in the whole period is inconsistent can be solved.

Description

technical field [0001] The invention relates to the technical field of optical fiber preform rod manufacturing, in particular to an OVD process adjustable deposition system and an adjustment method thereof. Background technique [0002] The process of manufacturing optical fiber preform rods by OVD process is: first, opaque powder rods are deposited on a rotatable core layer quartz rod in the deposition chamber, and then sintered into transparent optical fiber preform rods through a high-temperature heating furnace. [0003] The deposition process is to set up a deposition chamber in the deposition chamber, and the rotating chucks at both ends drive the core layer of quartz rods to rotate together, and multiple hydrogen-oxygen flame torches move in a circular motion while chemically reacting various gaseous raw materials and gases to form solid SiO 2 Tiny particles adhere to the core quartz rod and gradually become an opaque powder rod. The deposition chamber surrounds the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/40C23C16/52
CPCC23C16/402C23C16/52
Inventor 李亚明
Owner TENGCANG FENGHUO PHOTOELECTRIC MATERIAL TECH CO LTD
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