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A kind of manufacturing method of pure quartz glass hollow cylinder

A technology of quartz glass and manufacturing method, which is applied to glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve the problems of damaged pore walls in powder preforms, difficult to meet temperature requirements, unstable gas flow, etc., to ensure deposition. The effect of forming quality, reducing processing cost, and enhancing processing stability

Active Publication Date: 2022-05-06
长飞石英技术(武汉)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It was found that withdrawing the deposition target rod from the bore of the powder preform before or after sintering tends to result in damage to the bore walls of the powder preform, requiring costly bore finishing
[0006] In the patent WO2012136678, a deposition target rod made of a high-temperature-resistant and oxidation-resistant metal alloy is used to deposit silica particles. Since it is deposited in a horizontal manner, it is necessary to keep the temperature of the entire mandrel basically constant throughout the deposition process (keep at the temperature at the beginning of deposition. 50°), but in the actual deposition process, because the powder will cover the middle area of ​​the deposition target rod, and the turbulent flow in the deposition chamber will cause the unstable flow of the gas, it is difficult to meet the temperature requirements during the deposition process, unless the deposition target rod A lot of high-power heating units and temperature monitors are added to the system, which requires the diameter of the deposition target rod to be large enough, and at the same time greatly increases the production cost

Method used

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  • A kind of manufacturing method of pure quartz glass hollow cylinder
  • A kind of manufacturing method of pure quartz glass hollow cylinder
  • A kind of manufacturing method of pure quartz glass hollow cylinder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Embodiment 1: manufacture a quartz glass hollow cylinder with a length of 2200 mm and a weight of 120 kg.

[0026] The deposition target rod is a hollow rod structure, made of more than 99.9% alumina, with an outer diameter of 50mm, an inner diameter of 30mm, and a length of 3000mm. According to the empirical formula: (G / 100) 4 *Tmin / 4000≤Ra≤(G / 100) 4 *Tmin / 400 is calculated to be 0.68≤Ra≤5.70μm, in order to reduce the processing cost, choose Ra=1.60μm.

[0027] The deposition target rod 3 is installed in the chuck that rotates up and down, such as figure 1 As shown, it is an OVD (outside vapor deposition method) deposition device, the deposition chamber is a vertical target rod deposition method, including a deposition chamber 1, and an upper and a lower rotary chuck 2 are installed in the deposition chamber, corresponding to the rotary chuck A blowtorch assembly 4 is installed on one side of the deposition chamber, and the blowtorch assembly is installed in paralle...

Embodiment 2

[0030] With embodiment 1, the difference is that the upper and lower ends of the inner hole of the hollow rod deposition target rod 3 are provided with opening plugs 8, which are Teflon plugs, and the aperture of the opening plugs is 10mm, which reduces The aperture at the end of the hollow rod is used to control the flow of the airflow in the hollow rod, reduce the difference in temperature of the deposition target rod in different directions, and is beneficial to equalize the temperature. The rest remained unchanged, and the second stage of the actual deposition was measured, and the temperature of the target rod was monitored, and the temperature change was smaller and more uniform than that of Example 1.

Embodiment 3

[0032] Same as Example 2, the difference is that the hole diameter of the hole plug is reduced to 5 mm, and the rest remains unchanged. The second stage of actual deposition is measured, and the temperature of the target rod is monitored. Compared with Example 2, the temperature change is smaller and more uniform.

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Abstract

The invention relates to a method for manufacturing a hollow cylinder of pure quartz glass. The powder rod of the hollow glass cylinder is deposited by an external vapor deposition method. The deposition chamber adopts a vertical target rod deposition method, and the deposition target rod is high temperature resistant and oxidation resistant. Ceramics, alloys, or composite deposition targets with alloys as the base and covered with a ceramic layer. The surface of the deposition target maintains a certain roughness. The torch assembly is connected with a sliding seat that moves up and down. The disk drives the deposition target rod to rotate, turn on the blowtorch assembly to spray deposition powder to the deposition target rod and move up and down along the direction parallel to the deposition target rod axis, open the exhaust port, and the temperature difference of the heated area of ​​the entire deposition target rod is controlled at 350 °C Inside, after the deposition is completed and cooled, the target rod is extracted from the powder preform and sintered into a hollow cylinder of transparent pure silica quartz glass. The invention ensures the quality of deposition and molding of the powder rod, enhances the processing stability, simplifies the process and reduces the processing cost.

Description

technical field [0001] The present invention relates to a method for manufacturing a pure quartz glass hollow cylinder, more precisely, it relates to a method for manufacturing a pure silica quartz glass hollow cylinder with a central through hole, the pure quartz glass hollow cylinder can be It is used in the fields of optical fiber communication, optical glass and semiconductor technology. Background technique [0002] Pure silica quartz glass hollow cylinders are widely used in optical fiber, optical glass and semiconductor. The more common method of making pure silica quartz glass hollow cylinders is the external vapor deposition (OVD) method, that is, the deposition torch is used to deposit the silica nano-flow on the target target rod, and after the deposition is completed and cooled, the powder preform Pull out the target rod to form a hollow porous silica powder rod preform, and then sinter the hollow porous silica powder preform into a non-porous pure silica quartz...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03B20/00C03B37/014C03B37/018C03B19/06C03B19/14
CPCC03B20/00C03B37/014C03B37/01446C03B37/018C03B37/01853C03B19/066C03B19/14C03B19/1453
Inventor 胡俊中王瑞春刘善沛朱继红杨轶余保国赵亮
Owner 长飞石英技术(武汉)有限公司
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