A rare earth chloride anti-crystallization clogging atomizing nozzle device

Abstract

The invention belongs to the technical field of chemical equipment, in particular to a rare earth chloride anti-crystallization clogging atomizing nozzle device, comprising a nozzle seat and a spray head assembly installed at the front end of the nozzle seat. The spray head assembly includes a nozzle and a swirl structure, wherein the nozzle has a conical inner cavity; the swirl structure includes a directional swirler installed at the rear of the conical inner cavity, and a swirl movably installed at the front of the conical inner cavity. The swirler can be rotated with the axis of the conical cavity as the central axis, and the swirler is in contact with the inner wall of the conical cavity. The directional cyclone realizes the primary cyclone of the rare earth chloride solution, and the secondary cyclone is realized by the swirling cyclone, and finally the rare earth chloride solution is atomized into ultra-fine droplets and sprayed into the reaction furnace. Among them, the rotation of the swirling swirler can clean the inner wall of the nozzle, effectively prevent the nozzle from clogging, and prolong the service life of the directional swirler.

Description

technical field [0001] The invention belongs to the technical field of chemical equipment, in particular to a rare earth chloride anti-crystallization blockage atomization nozzle device. Background technique [0002] Most of the rare earth chloride solutions are easy to generate chlorine oxides during pyrolysis, so controlling the atomization reaction droplet size and temperature range is the key to the realization of the process, which requires the realization of the rare earth chloride solution atomization system before the atomization is completed. The pre-solution is in a relatively low temperature state (20-80°C), while the atomized droplets directly enter the high-temperature reaction zone (650-1350°C), using the principle that the heat transfer rate is greater than the chemical reaction rate, the chemical process is controllable. At present, the process is in the experimental stage, mainly because the temperature of the atomization system and the problem of crystalliz...

AI Technical Summary

Problems solved by technology

Although this device can realize the ejection of the gas-liquid mixture, it will cause the gas-liquid mixture to hang on the wall of the inner cavity formed by the nozzle cap and the nozzle rod, causing it to react and affect the experiment process.

[0005] A water vapor atomization spray plate, patent application number CN201822174802.0, consists of an upper plate, a middle plate, and a lower plate, and sprays the gas-liquid mixture at high pressure through the cavity formed between the plates. This kind of device is not suitable for If used for a long time, the spray plate is easy to be blocked, and it is inconvenient to clean, which affects the spraying of gas-liquid mixed droplets and affects the progress of the experiment.

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