Intelligent two-way traction dust falling curtain net system for large-span foundation pit construction
A two-way traction, large-span technology, applied in the direction of cleaning methods and appliances, pollution prevention methods, chemical instruments and methods, etc., can solve the problems that affect the efficiency of construction, reduce construction progress, increase labor intensity, etc., to achieve convenient management, The effect of reducing strength requirements and improving efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0031] In view of the fact that the top protective structure needs to be manually set up in the existing foundation pit construction, which consumes a lot of human resources, and has low efficiency and high cost, this embodiment is optimized to solve the problems in the prior art.
[0032] Specifically, such as figure 1 , figure 2 As shown, this embodiment discloses an intelligent two-way traction and dust suppression screen system for large-span foundation pit construction, including several sets of support structures relatively arranged on both sides of the foundation pit, each set of support structures includes corresponding matching side supports Support unit 1 and opposite side support unit 2; Direction traction cable 12 is set between this side support unit 1 and opposite side support unit 2, and at least one direction traction cable 12 is set on the direction traction cable 12 from this side support unit 1 to the foundation pit The protective curtain 3 extending in the ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com