Eccentric nail manufacturing process and eccentric nail

A manufacturing process, the technology of eccentric nails, applied in the direction of manufacturing tools, nails, staples, etc., can solve the problems of excessive waste, high manufacturing cost, and low utilization rate of raw materials, so as to achieve less waste generation, reduced manufacturing cost, and board The effect of high surface utilization

Active Publication Date: 2022-05-13
SHENZHEN HONGXUN M&E CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the embodiments of the present invention is to provide an eccentric nail manufacturing process to solve the technical problems of the existing eccentric nail manufacturing process, such as low utilization rate of raw materials, easy generation of more waste materials, and high manufacturing cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Eccentric nail manufacturing process and eccentric nail
  • Eccentric nail manufacturing process and eccentric nail
  • Eccentric nail manufacturing process and eccentric nail

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0037] In describing the present invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", The orientation or positional relationship indicated by "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than Nothing indicating or implying that a referenced device or element must have a particular orientation,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of eccentric nail manufacturing, and provides an eccentric nail manufacturing process and the eccentric nail. The manufacturing process of eccentric nails includes cutting, shaping and bending steps. In the material cutting step, the raw material board is cut into rough boards, and the rough boards include fixed boards and rough nail boards, and the rough nail boards include rough table materials and rough bar materials connected to the fixed boards; in the shaping step, the rough nail boards are The shaping is a preformed nail, and the preformed nail includes a forming table formed by shaping the blank table material and a forming rod material formed by shaping the blank rod material. The shape of the forming table material is the same as that of the eccentric table, and the shape of the forming rod material is Same shape as the eccentric rod; during the bending step, the preformed nail is bent so that the formed rod and the formed table together form the eccentric nail; the blank table or the formed table and the fixing plate are cut before or after the bending step the connection between. The eccentric nail manufacturing process generates less waste and has a higher utilization rate of raw materials, which is conducive to reducing manufacturing costs.

Description

technical field [0001] The invention belongs to the technical field of eccentric nail manufacturing, in particular to an eccentric nail manufacturing process and the eccentric nail. Background technique [0002] Such as figure 1 As shown, the eccentric nail includes an eccentric base and an eccentric rod connected to one side of the eccentric base in the thickness direction and close to the edge of the eccentric base. The central axis of the eccentric rod is spaced apart from the central axis of the eccentric base. In this regard, in the related industries, the above-mentioned eccentric nails are usually formed by upsetting bar materials through a cold heading process. However, this manufacturing process has a low utilization rate of raw materials, easily produces more waste materials, and has high manufacturing costs. Contents of the invention [0003] The purpose of the embodiments of the present invention is to provide an eccentric nail manufacturing process to solve t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B21G3/26B21G3/18B21D11/10B21D11/22B21D22/02B21D28/06B21D28/10B21D28/14B21D35/00B21D37/10B21D45/00F16B15/02
CPCB21G3/26B21G3/18B21D28/06B21D28/10B21D28/14B21D22/02B21D35/002B21D11/10B21D11/22B21D37/10B21D45/006F16B15/02
Inventor 李文兴
Owner SHENZHEN HONGXUN M&E CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap