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Magnetron sputtering coating device and working method thereof

A magnetron sputtering coating and magnetron sputtering technology, applied in the field of vacuum sputtering, can solve problems such as different distances, inconsistent coating thickness, inconsistent color and optical properties of end products, and achieve the effect of improving uniformity

Pending Publication Date: 2021-10-12
ADVANCED MICRO FAB EQUIP INC CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, during the rotation of the rotatable workpiece holder, the radius of rotation of each point on the workpiece to be coated is different, so that the distances from the magnetron sputtering source to different regions of the workpiece to be coated are different, resulting in The thickness of the coating film formed on the surface of the coating workpiece is inconsistent, which will bring inconsistency in color and optical properties to the end product

Method used

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  • Magnetron sputtering coating device and working method thereof
  • Magnetron sputtering coating device and working method thereof
  • Magnetron sputtering coating device and working method thereof

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Embodiment Construction

[0033] The present invention provides a magnetron sputtering coating device, comprising: a vacuum coating chamber; a rotatable work frame, which can rotate in the vacuum coating chamber along its central Coating workpiece, the workpiece to be coated has a surface to be coated, and the surface to be coated protrudes in a direction away from the central axis; at least one magnetron sputtering source is arranged in the vacuum coating chamber for spraying the workpiece to be coated sputter coating material particles on the surface of the magnetron sputtering source, and there is a gap between the magnetron sputtering source and the surface to be coated. The uniformity of the coating film prepared by using the magnetron sputtering coating device is good.

[0034] In order to make the above objects, features and beneficial effects of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the acco...

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Abstract

The invention relates to a magnetron sputtering coating device and a working method thereof. The magnetron sputtering coating device comprises a vacuum coating chamber; a rotatable workpiece frame which can rotate in the vacuum coating chamber along a central shaft of the rotatable workpiece frame and is provided with a plurality of side walls, wherein the side walls are used for bearing workpieces to be coated, the workpieces to be coated are provided with surfaces to be coated, and the surfaces to be coated protrude in the direction away from the central shaft; and at least one magnetron sputtering source which is arranged in the vacuum coating chamber and used for sputtering coating material particles to the surfaces of the workpieces to be coated, wherein gaps are formed between the magnetron sputtering sources and the surfaces to be coated. A coating film prepared by using the magnetron sputtering coating device is good in uniformity.

Description

technical field [0001] The invention relates to the field of vacuum sputtering, in particular to a magnetron sputtering coating device and a working method thereof. Background technique [0002] In recent years, the application of magnetron sputtering coating devices in industrial coating production has become increasingly widespread. In particular, as the market for touch screen-related end products continues to heat up, the use of magnetron sputtering coating devices to prepare coatings for touch screens with excellent performance has become one of the trends. [0003] Existing magnetron sputtering coating device generally comprises vacuum vacuum coating chamber, rotatable workpiece frame and magnetron sputtering source, wherein, described rotatable workpiece frame can be rotated in described vacuum vacuum coating chamber along its central axis, for Better to carry a plurality of flat plate workpieces to be coated, the rotatable workpiece frame is set to a polyhedron stru...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/50
CPCC23C14/35C23C14/505
Inventor 杜志游郭世平
Owner ADVANCED MICRO FAB EQUIP INC CHINA
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