The utility model discloses a
wafer feeding and conveying
system, which relates to the technical field of normal-pressure
chemical deposition and comprises an equipment body. A
wafer carrying platform, a
robot, a
wafer cooling rotating platform, a wafer lifting
system, a main supporting plate, a first linear guide rail, a first driving motor, a wafer heating
assembly, a wafer heating
assembly support and a vacuum generation
system are arranged in the equipment body. According to the system provided by the utility model, the non-
metal material layer made of high-purity
quartz, Si or SiC is arranged, so that the wafer is prevented from being polluted; after the wafer is moved out through the wafer lifting system and the first linear guide rail, the wafer is independently deposited under the wafer heating
assembly; and the deposition surface of each wafer completes film deposition at one time, so that the limitation of gas
diffusion and transmission is eliminated, and the thickness and quality uniformity of the deposited film are better. High-purity
quartz, a
robot and other transportation measures are adopted in a
closed system,
pollution of personnel to wafers is isolated, and the wafer
coating efficiency and the equipment integration degree are improved.