Plasma cleaning machine

A plasma cleaning machine and cleaning mechanism technology, applied in the field of cleaning, can solve the problems of low cleaning efficiency of material strips, unreasonable structure arrangement of plasma cleaning machines, etc., and achieve the effect of reducing transfer steps and shortening time

Pending Publication Date: 2021-12-10
SHENZHEN TETE SEMICON EQUIP CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The main purpose of the present invention is to propose a plasma cleaning machine, aiming to solve the problem of low cleaning efficiency of strips caused by unreasonable structural arrangement of existing plasma cleaning machines

Method used

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Embodiment Construction

[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0038] It should be noted that if there is a directional indication (such as up, down, left, right, front, back...) in the embodiment of the present invention, the directional indication is only used to explain the position in a certain posture (as shown in the accompanying drawing). If the specific posture changes, the directional indication will also change accordingly.

[0039]In addition, if there are descriptions involving "first", "second" and s...

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Abstract

The invention provides a plasma cleaning machine. The plasma cleaning machine comprises a material pushing mechanism, a transferring mechanism, a cleaning mechanism, a temporary storage mechanism and a material receiving mechanism, wherein the material pushing mechanism is used for pushing out material strips in a discharging box; the transferring mechanism comprises a transferring assembly and a pushing assembly arranged on the transferring assembly, the transferring assembly is movably arranged on the rack so that the transferring assembly can do rotary motion among the pushing mechanism, the cleaning mechanism and the temporary storage mechanism, and the transferring assembly is used for transferring the pushed-out material strips to the cleaning mechanism and transferring the cleaned material strips to the temporary storage mechanism; the cleaning mechanism is used for cleaning the material strips transferred to the cleaning mechanism; the pushing assembly is used for pushing the material strips transferred to the temporary storage mechanism to the material receiving mechanism; and the material receiving mechanism is used for receiving the material strips pushed to the material receiving mechanism. According to the plasma cleaning machine provided by the invention, the problem that the material strip cleaning efficiency is low due to the fact that an existing plasma cleaning machine is unreasonable in structural arrangement can be solved.

Description

technical field [0001] The invention relates to the technical field of cleaning, in particular to a plasma cleaning machine. Background technique [0002] In the chip industry, substrates, lead frames and other material strips usually leave pollutants such as overflow glue and oxides during production, which will affect the effect of bonding wires. At present, the material strips are mainly cleaned by plasma cleaning machines. However, the structure arrangement of the existing plasma cleaner is unreasonable, which causes the cleaning speed of the material strip to be too slow and the cleaning efficiency is low, which affects the production of the material strip. [0003] Therefore, be necessary to propose a kind of novel plasma cleaning machine, to solve above-mentioned technical problem. Contents of the invention [0004] The main purpose of the present invention is to provide a plasma cleaning machine, aiming to solve the problem of low cleaning efficiency of strips cau...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00B08B13/00
CPCB08B7/00B08B13/00
Inventor 陈天元谢育林李文强杨建新朱霆张凯
Owner SHENZHEN TETE SEMICON EQUIP CO LTD
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