Microelectronic devices with lower recessed conductive structures and related methods and systems
A technology of microelectronic devices and conductive structures, used in circuits, electrical components, semiconductor devices, etc.
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Embodiment 1
[0115] Embodiment 1: A microelectronic device comprising: a stack structure comprising a vertically alternating sequence of insulating structures and conductive structures arranged in layers; a conductive contact structure extending through the stack structure; and the conductive contact structure and an insulating material between the layers of the stack structure; in the lower portion of the stack structure, one of the plurality of conductive structures has a first width extending between a pair of the conductive contact structures portion; in a portion of the stack structure above the lower layer portion, another conductive structure of the plurality of conductive structures has another portion extending a second width between the pair of conductive contact structures, the first The second width is greater than the first width.
Embodiment 2
[0116] Embodiment 2: The microelectronic device of Embodiment 1, wherein the conductive contact structures taper in width from a widest width at the top of the stack structure to a width at or below the stack structure bottom. The narrowest width.
Embodiment 3
[0117] Embodiment 3: The microelectronic device of any one of embodiments 1 and 2, wherein: the insulating material tapers in width across the portion above the underlying portion of the stack; And the insulating material in the lower portion extends laterally to define an insulating extension vertically adjacent an end of the insulating structure of the lower portion.
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