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Method for determining set of injection areas of sample and information processing device

A region and sample technology, which is applied in the photoengraving process exposure device, the photoengraving process of the pattern surface, the microlithography exposure equipment, etc., can solve the problem of not establishing a clear reduction method, etc.

Pending Publication Date: 2022-03-29
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, currently, the number of measurement points is reduced by trial and error, and no clear reduction method has been established

Method used

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  • Method for determining set of injection areas of sample and information processing device
  • Method for determining set of injection areas of sample and information processing device
  • Method for determining set of injection areas of sample and information processing device

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Embodiment Construction

[0029] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following examples are not intended to limit the scope of the claimed invention. A number of features have been described in the embodiments, but the invention is not limited to requiring all such features, and a plurality of such features can be combined as appropriate. Also, in the drawings, the same or similar configurations are given the same reference numerals, and redundant descriptions thereof are omitted.

[0030] The present invention provides a technique for determining the position of a measurement point on a substrate, which is advantageous in improving the alignment accuracy of the substrate, and a lithographic apparatus to which such a technique is applied will be described below. As a specific example, an example in which the present invention is applied to an exposure apparatus, which is an example of a photolithography apparatus, will be desc...

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Abstract

The invention discloses a method for determining a set of shot regions of a sample and an information processing device. There is provided a method of determining a set of sample shot regions from a plurality of shot regions of a substrate, in each sample shot region the position of a mark is to be actually measured. The method includes setting an initial arrangement of a set of sample shot regions, and adding a shot region among shot regions other than the sample shot regions in the initial arrangement to the set of sample shot regions, a value indicating an uncertainty of an estimated value of a measured value of a position of the mark obtained using the estimation model in the shot region exceeds a predetermined threshold.

Description

technical field [0001] The invention relates to a method of determining a set of shot regions of a sample, a method of obtaining measurements, an information processing device, a lithographic device, a storage medium and a method of manufacturing an article. Background technique [0002] Along with micropatterning and higher integration of devices, there is a growing demand for improved device alignment accuracy. In order to improve alignment accuracy, it is necessary to check alignment offset (hereinafter will be referred to as overlay) with high precision, and to control the offset amount based on the alignment offset. Therefore, the need for increased coverage checking accuracy is also growing. [0003] In order to perform alignment and overlay inspection with high precision, it is necessary to increase the number of measurement points on a measurement target object such as a wafer or a panel, which will be referred to hereinafter as a substrate. However, increasing the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70491G03F9/7088G03F9/7049G03F9/7046H01L22/20H01L22/12G03F7/70633G03F7/706833G03F7/70683G03F7/706841G03F9/7084G03F7/70508H01L21/68
Inventor 江头信一
Owner CANON KK