Anti-glare surface with ultra-low flash and method of making same
A surface roughness and product technology, applied in the field of anti-glare surface with ultra-low flash and its manufacture, can solve the problem of reducing the expected image resolution, sacrificing the expected image clarity and resolution, and interfering with the expected image readability of the expected image and other issues to achieve the effect of expanding the scale
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Embodiment 1
[0135] Embodiment 1 includes a method of making an article comprising etching a surface of a substrate with an etching suspension comprising an etching paste and glycerin, wherein the article includes no more than 1% glitter.
Embodiment 2
[0136] Embodiment 2 includes embodiment 1, wherein the etching suspension includes from about 5 wt % to about 30 wt % glycerin.
Embodiment 3
[0137] Embodiment 3 includes any of embodiments 1 to 2, wherein the etching paste includes one or more salts selected from the group consisting of: NH 4 F, NH 4 HF 2 , KF, FeCl 3 、KNO 3 , BaSO 4 , CuCl 2 , Fe 2 (SO 4 ) 3 , Fe(NO 3 ) 3 、CoCl 2 、Co 2 SO 4 , Co(NO 3 ) 2 、NiCl 2 、Ni 2 SO 4 , Ni(NO 3 ) 2 , ZnCl 2 , Zn 2 SO 4 , Zn(NO 3 ) 2 , CaCl 2 , Ca 2 SO 4 , Ca(NO 3 ) 2 , MgCl 2 , Mg 2 SO 4 , Mg(NO 3 ) 2 and their combinations.
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Abstract
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