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Apparatus for processing substrate and method for measuring degree of wear of consumable component

A consumable, height-measuring technology, applied in the direction of optical devices, measuring devices, semiconductor/solid-state device testing/measurement, etc., can solve problems such as focus ring damage, focus ring identification, scratches, etc.

Pending Publication Date: 2022-04-19
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the former case, it may be difficult to properly identify the degree of wear of the focus ring at the desired time, while in the latter case the focus ring may be damaged by physical contact between the focus ring and the measuring instrument ( For example, scratch)

Method used

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  • Apparatus for processing substrate and method for measuring degree of wear of consumable component
  • Apparatus for processing substrate and method for measuring degree of wear of consumable component
  • Apparatus for processing substrate and method for measuring degree of wear of consumable component

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Embodiment Construction

[0045] Hereinafter, embodiments of the inventive concept will be described in detail with reference to the accompanying drawings so that those skilled in the art to which the inventive concept pertains can easily implement the inventive concept. However, the inventive concept can be implemented in various forms and is not limited to the embodiments described herein. Also, in describing the embodiments of the inventive concept, when detailed descriptions related to well-known functions or configurations may unnecessarily obscure the subject matter of the inventive concept, they will be omitted. In addition, components performing similar functions and operations have the same reference numerals throughout the drawings.

[0046] The terms "comprising" and "comprising" in the specification are "open" expressions, just to illustrate the existence of corresponding components, and do not exclude but may include other components unless there is a specific description to the contrary. ...

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Abstract

An apparatus for processing a substrate includes: a processing chamber having a processing space; a support unit that supports the substrate in the processing space; a lifting pin module having a lifting pin that moves the consumable member on the support unit in the up / down direction; and a measuring unit that measures the degree of wear of the consumable part and has a light receiving member that receives the light emitted in the horizontal direction.

Description

technical field [0001] Embodiments of the inventive concept described herein relate to an apparatus for processing a substrate and a method for measuring a degree of wear of a consumable part. Background technique [0002] Plasma refers to an ionized gaseous state of matter containing ions, free radicals, and electrons. Plasmas are created by heating a neutral gas to very high temperatures or subjecting a neutral gas to a strong electric or RF electromagnetic field. The semiconductor member manufacturing process may include an etching process that uses plasma to remove a thin film on a substrate such as a wafer. The etching process is performed by collision or reaction of ions and / or radicals contained in the plasma with the thin film on the substrate. [0003] An apparatus for processing a substrate using plasma includes a processing chamber under a vacuum atmosphere, a support chuck supporting a substrate in the processing chamber, and a focus ring surrounding the substr...

Claims

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Application Information

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IPC IPC(8): H01J37/32
CPCH01J37/32642H01J37/32449H01J37/32715H01J37/32119H01J37/3288H01L22/30H01L22/12H01L21/67069H01L21/68742G01B11/0608H01L21/67196H01J2237/24585H01J2237/334G01B11/06
Inventor 元喆浩
Owner SEMES CO LTD
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