Photomask etching positioning device capable of accurately controlling etching deviation

Abstract

The invention discloses a photomask etching positioning device capable of accurately controlling etching deviation. The photomask etching positioning device comprises a positioning base and moving guide wheels fixedly installed on the left side and the right side of the bottom face of the positioning base. The middle of the top face of the positioning base is fixedly connected to the middle of a guide sliding rod. A guide threaded rod is transversely and rotationally arranged at the upper part of the interior of the positioning base through a bearing; wherein a driving mechanism is fixedly arranged on the lower portion of the interior of the positioning base, and a driving gear is rotationally arranged at the center position of the interior of the driving mechanism through a bearing; the middle of the guiding threaded rod in the positioning base is connected to the middle of the top face of a driving gear in the driving mechanism in a meshed mode through a bevel gear. According to the photomask etching positioning device capable of accurately controlling the etching deviation, the left side and the right side of the etching plate are driven by the clamping mechanism on the top surface of the positioning base and the clamping frame to be limited and descend at the same time, and meanwhile the front side and the rear side of the etching plate are limited through the locking sliding rods.

Description

technical field [0001] The invention relates to the technical field of etching processing, in particular to a positioning device for mask etching which can precisely control etching deviation. Background technique [0002] Etching is a technique in which material is removed using chemical reactions or physical impact. Etching techniques can be divided into two categories: wet etching and dry etching. [0003] At present, most of the etched plates need to be etched during the processing process, but most of the current etched plates are inaccurate and easy to shake during processing, and the height of the relevant processing equipment is fixed, which is not suitable for use with different heights. It is inconvenient for users to operate, and most of the etching plates are installed by bolts, which is inconvenient to operate, and requires tools to be disassembled during disassembly, which is cumbersome to operate and easily affects the effect of etching. [0004] Therefore, ...

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Problems solved by technology

[0005] The purpose of the present invention is to provide a positioning device for photomask etching that can accurately control etching deviation, to solve the problem that most of the etching plates on the market currently proposed by the above-mentioned background technology need to etch the etching plates during processing, but at present Most of the etched plates are inaccurately positioned during processing and are easy to shake, and the height of the related processing equipment is fixed, which is not suitable for users of different heights. When disassembling, tools are needed to disassemble, the operation is cumbersome, and it is easy to affect the effect of etching

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