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Washing apparatus for removing residual materials

A residue, cleaning agent technology, used in the field of cleaning devices

Inactive Publication Date: 2005-08-31
BASF AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The same problem often occurs when using other evaporators such as rectification columns

Method used

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  • Washing apparatus for removing residual materials
  • Washing apparatus for removing residual materials

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In a preferred embodiment, the outlet container is directly connected to the outlet valve, the cleaning water valve, the container outlet valve, the cleaning outlet valve and the vent valve via connecting lines.

[0020] The outlet container is usually located above and below the bottom of the collection container.

[0021] The cleaning outlet pipe can lead into the bottom outlet pipe so that the outlet pipe element can discharge cleaning agent and bottom product at the same time. However, the outlet pipe element is preferably manufactured in the form of two pipes, one for the cleaning outlet and one for the bottom outlet, so that the bottom product and cleaning agent are discharged via different outlets respectively.

[0022] Usually the evaporation plant is evacuated, since usually mild evaporation is only possible under reduced pressure (which then takes place at lower temperatures). Air will therefore permeate through the bottom outlet into the evaporator during re...

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PUM

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Abstract

A cleaning apparatus for removing residues from the bottoms outflow of an evaporation apparatus which produces tops product and bottoms product and is equipped with an outflow, comprising: a) an outflow vessel (7), b) a collection vessel (8), c) an outflow valve (10), d) a cleaning water valve (11), e) a vessel outflow valve (12), f) a cleaning outflow valve (13), g) a vent valve (14), h) a line (17) leading from the bottom to the outflow valve (10), i) a cleaning agent introduction tube (3), j) an outflow line device (6, 16) andconnection lines between the devices a) to j). The cleaning apparatus can be used in the workup of salt-containing solutions by distillation.

Description

technical field [0001] The invention relates to a cleaning device for removing residues from the bottom outlet of an evaporation device, and to the use of the device in distillative treatment of saline solutions. Background technique [0002] Thin-film evaporation is used in continuous distillation, especially for evaporating heat-sensitive substances from high-boiling residues and for concentrating substances with poor thermal stability. In this case the liquid is distributed by trickle flow (falling film evaporators), the action of centrifugal force (a specific type of rotary evaporator), specially constructed scrapers (filmtruders) or other The heated surface forms a thin film (film thickness typically on the order of about 0.1 mm). The liquid film evaporates rapidly, so that the existing components are exposed to the (usually) relatively high temperature in the evaporator for only a short time. Residence time, temperature and pressure (vacuum) are designed according to...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D1/22B08B3/08B08B9/08
CPCB08B9/08
Inventor F·范桑特J·德赫尔特D·克菲尔G·泰斯W·特尔容
Owner BASF AG