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Method for cold process deposition of antiglare layer

An anti-reflection and build-up layer technology, applied in coatings, layered products, sputtering, etc., can solve the problems of increased absorption of MgF2 layer, cumbersome methods, and increased production costs.

Inactive Publication Date: 2006-02-01
ESSILOR INT CIE GEN DOPTIQUE
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

But on the other hand, the denser the deposit, the poorer the adhesion
In addition, ion assistance makes MgF 2 Higher layer absorption, which is very unfavorable for ophthalmic applications
Finally, this type of assistance makes the whole process cumbersome, significantly increasing production costs

Method used

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  • Method for cold process deposition of antiglare layer
  • Method for cold process deposition of antiglare layer

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Embodiment

[0046] In order to characterize the properties of the antireflective buildups obtained according to the method of the invention, we prepared antireflective buildups on organic substrates (CR39) using different high refractive index materials.

[0047] SiO for matrix 2 / HI / SiO 2 / HI / MgF 2 Coating layer coating consisting of four layers of overcoating type (HI stands for material with high refractive index).

[0048] The process of the invention is carried out with a Balzers BAK 760 vacuum evaporator.

[0049] The different HI materials used are listed in the table below. The respective suppliers are indicated in parentheses. For each high refractive index material, we treated the bottom layer of HI material with ion bombardment in the presence of argon gas at a voltage of 100 V and a current of 1 A for 1 min to obtain a matrix, The second matrix was not treated with ion bombardment. Next, MgF was deposited by vacuum evaporation without ion assistance 2 .

[0050] In the...

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Abstract

The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 DEG C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

Description

technical field [0001] The invention relates to a method for performing anti-reflection treatment on an organic substrate, especially an ophthalmic lens, by using a vacuum evaporation deposition technique. Such coatings are generally produced from metal oxides with high and low refractive indices. Background technique [0002] The effectiveness of anti-reflection treatments depends largely on the refractive index value of the deposited layer. Limiting factors, both related to the type of sediment used and to the nature of the substrate to be treated, limit the materials available for such treatment. [0003] Manufacturers need to develop more efficient anti-reflection treatments. In the field of ophthalmology, if the effectiveness of such treatments is measured by the reflection value of each surface, 1.6-2.5% is low effectiveness, 1.0-1.8% is moderate effectiveness, and now it must reach 0.3-0.8% to be considered is highly effective. [0004] These constraints force the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06G02B1/00B32B7/02G02B1/11
CPCC23C14/0694G02B1/116Y10T428/24942G02B1/115C23C14/06
Inventor Y·黑尔姆施泰特J·D·贝恩哈尔F·阿鲁伊
Owner ESSILOR INT CIE GEN DOPTIQUE
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