Manufacturing method for self-cleaning glass
A production method and self-cleaning technology, applied in the field of self-cleaning glass production, can solve the problems of prolonging the construction period, increasing the production process and cost, and low production efficiency.
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Embodiment 1
[0015] Implementation 1: Fabrication of SiO 2 Thin touch and TiO 2 The raw materials of the photocatalytic film are all organic materials.
[0016] Deposition of SiO in transition raceway area 2 , after atomizing silicone grease or silane (quantity 20ml / l), it is brought into the top of the glass in the transition raceway area by the carrier gas to realize SiO at a temperature of 550°C. 2 production. The time for the glass to move through this spray area should be 1 minute, and the carrying gas is Ar, N 2 , O 2 of mixed gas.
[0017] Deposit TiO in zone A of the annealing process 2 Thin film, first ultrasonically atomize the titanium grease (quantity 40ml / l), and then bring it into the glass in area A by the carrier gas (at this time, SiO has been deposited on the glass 2 thin film) to achieve TiO 2 Film production. The time for the glass to move through this spray area is 1 minute, and the temperature is 500°C. Carrying gas is Ar, N2, O 2 of mixed gas. Finally, a ...
Embodiment 2
[0018] Implementation 2: Preparation of SiO 2 The thin film uses organic raw materials to prepare TiO 2 The film uses inorganic raw materials.
[0019] Basically the same as implementation 1. The difference is: deposited SiO 2 The time is 1 minute and the temperature is 550°C; TiO is deposited in the B and C areas of the annealing process 2 For the film, the raw material is metatitanic acid or fluorotitanic acid or titanyl sulfate (concentration expressed as titanium dioxide is 10g / l), the temperature is 400°C, and the time for the glass to pass through the atomization area should be 2 minutes. Finally, a photocatalytic superhydrophilic film with a thickness of 0.5 μm was deposited on the glass plate.
Embodiment 3
[0020] Implementation 3: Preparation of SiO 2 or SnO 2 or ZnO and TiO 2 The films are all made of corresponding inorganic raw materials.
[0021] Basically the same as implementation 1. The difference is: deposited SiO 2 or SnO 2 Or for ZnO, the time is 2 minutes, the temperature is 610°C, and the raw material is SiCl 4 or silicic acid or SnCl 4 or ZnCl 2 (quantity 20g / l); Deposit TiO in zones B and C of the annealing process 2 Film, the temperature is 300°C, the time for the glass to pass through the atomization area should be 2 minutes, and the carrying gas is compressed air. Finally, a photocatalytic superhydrophilic film with a thickness of 1 μm was deposited on the glass plate.
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