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Gas distributing method, device and silencer-catalyst system

A technology of gas, vortex, applied in the direction of exhaust device, separation method, silencer device, etc.

Inactive Publication Date: 2003-04-02
HALDOR TOPSOE AS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Traditional approaches such as those mentioned above do not include any design that exhibits both uniform flow distribution and limited pressure variation

Method used

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  • Gas distributing method, device and silencer-catalyst system
  • Gas distributing method, device and silencer-catalyst system
  • Gas distributing method, device and silencer-catalyst system

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Embodiment Construction

[0020] Using the method and device of the present invention, the flow direction of the gas at a high velocity, e.g. 100 m / s, can be turned by 90° and at the same time it is possible to equally distribute the gas over an outlet surface area 10-20 times larger than the inlet surface area, The device of the present invention is useful for controlling pressure loss and a minimal drop in pressure was observed, the observed reduced pressure drop being attributable to the establishment of a uniform gas flow after passing through the gas distribution device.

[0021] In the case of the use of gas distribution devices in mufflers, the size of the device in the axial direction is limited to a maximum of 2.5 times the diameter of the inlet pipe, this limitation is purely due to the smallest possible space in the muffler and the gas distribution device, the device Too large to fit in the muffler, when the unit is to be placed in the muffler, the unit can be placed approximately 100mm upstr...

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PUM

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Abstract

The invention concerns a method and a device for the distribution of gas comprising transferring the gas into a swirl chamber (1) through an inlet section (2) positioned tangentially to the swirl chamber, swirling the gas in the swirl chamber (1) by passage through a number of equally displaced bent vanes (4), the surface of the upstream part of the vanes lying in a plane perpendicular to the swirl chamber's axis, the downstream part of the vanes being parallel to the swirl chamber's axis, and the vanes (4) extending radially outwards, and passing the gas through an outlet section (3) positioned downstream the swirl chamber (1).

Description

technical field [0001] The present invention relates to methods and apparatus for distributing gas using a gas dispensing device, and more particularly, the present invention relates to the dispensing of fast flow gas through the dispensing device which results in low pressure drop and good gas distribution. Background technique [0002] Gas distribution is important in many applications, and an area of ​​particular importance is the treatment of exhaust gases from combustion systems. [0003] In the European van industry, the tangential entry of the exhaust gases from the internal combustion engine into the applied muffler-catalyst system is the norm. It is important that the required system be as small as possible due to the lack of space. However, this leads to Gas distribution restrictions, which also affect the pressure drop and flow distribution of the exhaust gas stream. [0004] Uniform flow distribution is readily achievable if the presence of pressure drop is main...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F01N1/08B01D53/94B01F5/06F01N3/00F01N3/24F01N3/28
CPCF01N3/2892Y10T137/9682Y10T137/0318B01D53/94
Inventor O·霍姆-克里斯坦森
Owner HALDOR TOPSOE AS