Grinding cloth for directional processing

A technology of abrasive cloth and fiber, which is applied in the field of abrasive cloth, and can solve problems such as not being durable, easy to denaturation, and variability
CN1423158AInactive Publication Date: 2003-06-11HITACHI DISPLAYS
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
HITACHI DISPLAYS
Publication Date
2003-06-11
Estimated Expiration
Not applicable · inactive patent

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Abstract

A rubbing cloth used for rubbing to control the alignment of liquid crystal molecules. The rubbing cloth comprises; the pile portion containing fibers comprising a cellulose acetate. The fibers comprising a cellulose acetate may be textured filament yarns provided with crimps. The cellulose acetate may have an acetylation degree of 45% or more. The rubbing cloth can have properties of great alignment force, low frictional electrification, and high wear resistance together.
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Description

technical field

[0001] The invention relates to a grinding cloth used for controlling the orientation of liquid crystal molecules in the process of manufacturing liquid crystal panels. Background technique

[0002] A liquid crystal display component for a transmissive liquid crystal display device, including a TFT substrate of a driving component (TFT) composed of a thin film transistor, and a color filter substrate (hereinafter referred to as a CF substrate) formed with a color filter separated by a Arranged facing each other at tiny intervals, and liquid crystals are sealed in the gaps. On the surface of the TFT substrate, patterned ITO electrodes serving as pixel electrodes are arranged, and an alignment film is arranged to cover the ITO electrodes. On the other hand, an ITO film as a common electrode is arranged on the surface of the CF substrate, and an alignment film is arranged on the surface of the ITO film. The TFT substrate and the CF substrate are arranged facin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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