Pneumatic driver with valve kinematic speed adjustment

A technology driven by air pressure and moving speed, which is applied in the direction of valve operation/release device, valve device, valve details, etc., and can solve the problems of particle generation, self damage, good rate drop, etc.

CN1472463AInactive Publication Date: 2004-02-04SILICON INTEGRATED SYSTEMS
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2004-02-04
Estimated Expiration
Not applicable · inactive patent

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Abstract

A pneumatic driver for regulating the moving speed of valve has a main container body whose internal space is divided by a piston into two spaces with respective opening for installing tube, a pressure regulating valve installed to said tube for regulating the pressure of gas coming in said main container body, and a valve with a long axle connected to said piston via said opening. The pressure of gas in the container is regulated by said pressure regulating valve to control the speed of piston and in turn the moving speed of valve.
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Description

technical field

[0001] The invention relates to a pneumatic driving device for adjusting the moving speed of a valve, and is especially applied to a valve used in a semiconductor process to switch a reaction chamber. Background technique

[0002] The good rate has always played an important role in semiconductor manufacturing, so semiconductor manufacturers invest a lot of manpower and money in improving and maintaining the good rate. The improvement of the good rate not only reduces the cost but also increases the profit.

[0003] One of the main reasons for the decline in the good rate is the inability to effectively control the number of particles attached to the chip, because particles are one of the culprits of chip defects. Particles may damage the chip structure, leak electricity or even short circuit, making the components unusable. Because particle control is so important, semiconductor equipment will be placed in clean rooms with different cleanliness levels such...

Examples

Embodiment Construction

[0014] Please refer to figure 1 , which is a device diagram according to a preferred embodiment of the present invention. In the figure, the wafer port (Wafer Port) 20 of the reaction chamber (Process Chamber) 10 uses a pneumatic drive device to open and close the valve (Door) 40 . figure 2 for figure 1 An enlarged view of the pneumatic drive device. The above-mentioned pneumatic drive device includes a container body 30 in which a piston 35 is divided into a gas storage space A and a gas storage space B. The piston 35 passes through the opening of the gas storage space A through a long axis 45 Connect with valve 40. Each of the two gas containing spaces has an opening connection, the gas containing space A is connected to the gas conduit 60 , and the gas containing space B is connected to the gas conduit 50 . Both the gas conduit 50 and the gas conduit 60 are connected to a solenoid valve 90 , and a pressure regulating valve is installed between the container main body 30...