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Etching agent fume exhauster

A technology for discharging device and etchant, applied in the direction of removing smoke and dust, optics, instruments, etc., can solve the problems of pollution and corrosion of etching equipment

Inactive Publication Date: 2004-07-14
LG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This will contaminate and corrode the etch equipment in the apparatus 100

Method used

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  • Etching agent fume exhauster
  • Etching agent fume exhauster
  • Etching agent fume exhauster

Examples

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Embodiment Construction

[0046] Hereinafter, embodiments of the present invention will be described in detail, examples of which are illustrated in the accompanying drawings.

[0047] The structure of the etchant supply device installed in a typical etching system is similar to that in FIG. 1 . FIG. 1 schematically shows an etchant supply device in a typical etching system.

[0048] The description of a typical etching system shown in FIG. 1 is similar to the description in the background art, and therefore, the background art will be briefly cited hereinafter.

[0049] The etchant supply device 100 shown in FIG. 1 uses the movement of the pump 150 to mix the etching compounds contained in the first etchant tank 110a and the second etchant tank 110b, and mix the etching compound The reagent is supplied to an etch chamber in which the etch process is performed. When etching is performed during the preparation of the thin film transistor substrate and the color filter substrate of the LCD device, the ...

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Abstract

An etchant fume exhaust apparatus is installed in a system performing an etching process during fabrication of LCDs. The etchant fume exhaust apparatus prevents the contamination and corrosion of the etching system by allowing both gaseous and liquid etchant to be discharged safely. The etchant fume exhaust apparatus includes an exhaust hole that provides a passage to discharge gaseous etchant, an exhaust plate located under the exhaust hole that collects condensed etchant dripping from the exhaust hole, a support part that fixes the exhaust plate to the exhaust hole, and an exhaust line connected to the bottom of the exhaust plate through which the etchant collected in the exhaust plate is removed from the etchant plate.

Description

technical field [0001] The present invention relates to a wet etching system, and more particularly, to an etchant fume exhaust device installed in an etching system used in an etching process for manufacturing a liquid crystal display device to remove gaseous and liquid etchant are discharged from the system, thereby avoiding contamination and corrosion of the etching system. Background technique [0002] With the recent rapid development of technology in the semiconductor device manufacturing industry, improved liquid crystal display (LCD) device products have been produced that are thinner and brighter. Until now, CRTs (cathode ray tubes) have been widely used in display devices, which have advantages in function and price, but also have many disadvantages, including difficulties in miniaturization and portability. [0003] In contrast, LCD devices have many advantages over CRTs, especially for mobile devices. These advantages include that the device can be miniaturized...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13B08B15/02H01L21/00
CPCH01L21/67063B08B15/02H01L21/67017G02F1/13
Inventor 曺东烈
Owner LG DISPLAY CO LTD