Apparatus for the generation and supply of fluorine gas

Abstract

The present invention provides a fluorine gas generating and supplying device which is provided in a gas supply system of a semiconductor processing system and which is backed up by a safe and inexpensive structure in the event of an abnormality in the device. An apparatus 30 for generating and supplying gas is provided in a gas supply system of a semiconductor processing system. The apparatus 30 comprises an electrolytic cell 34 for generating fluorine gas and a cylinder 62 for containing an alternative gas selected from the group consisting of nitrogen fluoride, sulfur fluoride and chlorine fluoride. Electrolytic cell 34 and cylinder 62 are connected to a gas switching zone 56 which selectively supplies a gas utilization zone with fluorine gas from electrolytic cell 34 or alternative gas from cylinder 62 . A controller 40 controls the gas switching section 56 so that when an electrolytic cell detector 36 detects an abnormal state of the electrolytic cell 34, an alternative gas is supplied from the cylinder 62 to the gas utilization section.

Description

technical field [0001] The present invention relates to an apparatus which is installed in a gas supply system of a semiconductor processing system and which generates and supplies fluorine gas. In this context, "semiconductor processing" refers to the process of manufacturing semiconductor devices and / or semiconductor device connection structures (such as interconnect lines, electrodes) on the substrate to be processed (target substrate) , For example, various processes for forming semiconductor, insulator and conductor layers on a semiconductor wafer or LCD substrate. Background technique [0002] In manufacturing semiconductor devices, various semiconductor processes such as film formation, etching and diffusion are performed on a target substrate such as a semiconductor wafer or an LCD substrate. Semiconductor processing systems for these processes employ fluorine-type gases as process gases in a variety of applications, such as for etching silicon and silicon dioxide f...

AI Technical Summary

Problems solved by technology

However, this backup solution entails high initial and high operating costs for the gas supply system

Moreover, although the fluorine cylinder can also be used as a backup device, it causes safety problems because the high-pressure fluorine cylinder is placed in the gas supply system of a semiconductor processing system

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