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Oscillating shower transfer type substrate treatment device

A substrate processing device and spray-type technology, which are applied in the directions of optics, instruments, electrical components, etc., can solve the problems of inability to eliminate, remain, and poor wettability of the glass substrate 4, and achieve the effect of eliminating shortcomings.

Inactive Publication Date: 2005-10-19
SUMITOMO PRECISION PROD CO LTD
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  • Abstract
  • Description
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AI Technical Summary

Problems solved by technology

[0011] In addition, the Al etchant has a higher viscosity than the Cr etchant, and has poor wettability to the surface of the glass substrate 4
In addition, as mentioned above, the high corrosion rate
Therefore, at the beginning of the spray treatment, the part where the fine droplets of the corrosive liquid hit becomes uneven, and it cannot be eliminated even after the subsequent spray treatment, and remains after the corrosion.

Method used

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  • Oscillating shower transfer type substrate treatment device
  • Oscillating shower transfer type substrate treatment device
  • Oscillating shower transfer type substrate treatment device

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Embodiment Construction

[0027] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0028] The swing-shower transfer type substrate processing apparatus of this embodiment is an apparatus for performing an Al etching process on a glass substrate 100 for a liquid crystal display device (hereinafter simply referred to as the substrate 100 ). Such as figure 1 As shown, the substrate processing apparatus adopts a linear first transfer line A, a second transfer line B connected to the first transfer line A at a right angle, and a second transfer line B connected to the second transfer line B at a right angle and parallel to the first transfer line A. The U-rotation layout formed by the combination of the third transmission line C.

[0029] The first transmission line A is configured by linearly connecting the receiving section 10 , the liquid blocking section 20 , and the corrosion section 30 . The second transfer line B is a water washing unit 40 and in...

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Abstract

This case is to provide a moving substrate processing device which can efficiently remove bubbles that are produced on a surface of processing liquid that is supplied to the surface and which can solve non-uniform processing rate in width direction which is key point of large substrate. The processing liquid is supplied, m horizontal direction, to a plurality of spray nozzle 34a of a substrate 100 entire surface so as to shake at both sides in a moving direction toward the substrate 100. A liquid flow from one side portion to another side portion and a liquid flow from one side portion to another side portion can form interactively.

Description

[0001] This application is a divisional application of Chinese Invention Patent Application No. 01804736.X. technical field [0002] The present invention relates to a conveyor-type substrate processing apparatus used in the manufacture of glass substrates for liquid crystal display devices and the like. Background technique [0003] A glass substrate used in a liquid crystal display device is manufactured by repeatedly performing chemical treatments such as etching and peeling on the surface of a glass substrate as a base material. The processing equipment is roughly divided into dry type and wet type; wet type is further divided into batch type and blade type; blade type is further divided into rotary type and transfer type based on roller transfer, etc. [0004] Among these substrate processing apparatuses, the transfer type apparatus has a basic structure of supplying a processing liquid to the surface of the substrate while conveying the substrate in the horizontal dire...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00
CPCH01L21/67051
Inventor 下田亨志田内仁
Owner SUMITOMO PRECISION PROD CO LTD
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