Cleansing method and cleansing liquid supplying device therefor

A technology for supplying devices and cleaning fluids, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., capable of solving problems that hinder the absorption of cleaning fluid conflict energy, etc.
CN1745911AInactive Publication Date: 2006-03-15XEVIOS CORP
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
XEVIOS CORP
Publication Date
2006-03-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a cleaning method and a cleaning liquid feeding deviece for carrying out the method. wherein the method prevents a film forming of a cleaning liquid on a material to be washed, and at the same time, enables also the prevention of the back flow of the cleaning liquid and foreign materials on the material to be washed. In the cleaning method which sprays the cleaning liquid continuously to the material to be washed, a high-pressure cleaning liquid is sprayed to the material to be washed continuously in a flow rate of 14-17 m / sec, and at the same time, the flow rate of the cleaning liquid sprayed continuously increases up to 100-120 m / sec in a cycle of 20-50 c / sec to add strength and weakness to the cleaning liquid. Accordingly, since the strength and weakness added to the cleaning liquid blows out the cleaning liquid sprayed to the material to be washed, no coating film of the cleaning liquid is formed on the material to be washed. Further, since the cleaning liquid is sprayed continuously to the material to be washed, it is possible to flow the cleaning liquid bumped against the material to be washed on the material to be washed always together with the removed foreign materials, and to prevent the back flow on the material to be washed.
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Description

technical field

[0001] The present invention relates to cleaning methods used in manufacturing steps of liquid crystal panel manufacturing, PDP panel manufacturing, organic EL panel manufacturing, FED panel manufacturing, printed circuit board manufacturing, semiconductor manufacturing, film manufacturing, plate manufacturing, and other electronic equipment parts. Implement the cleaning liquid supply device of this method, more specifically, the present invention relates to following cleaning method and the cleaning liquid supply device that implements this method, it is characterized in that to the object to be cleaned while spraying high-pressure cleaning liquid continuously The cleaning liquid is strengthened and weakened, and while continuously spraying high-pressure cleaning liquid to the object to be cleaned, the cleaning liquid that has been strengthened and weakened is sprayed to the object in parallel with the continuous spraying of the cleaning liquid. Cleaning. Ba...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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