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Cleansing method and cleansing liquid supplying device therefor

A technology for supplying devices and cleaning fluids, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., capable of solving problems that hinder the absorption of cleaning fluid conflict energy, etc.

Inactive Publication Date: 2006-03-15
XEVIOS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, this method has the following problem, that is, since the cleaning liquid is continuously impacted on the object to be cleaned, a coating film of the cleaning liquid is formed on the object to be cleaned, and the coating film hinders and absorbs the conflict energy of the cleaning liquid.

Method used

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  • Cleansing method and cleansing liquid supplying device therefor
  • Cleansing method and cleansing liquid supplying device therefor
  • Cleansing method and cleansing liquid supplying device therefor

Examples

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Embodiment 1

[0038] Below with reference to accompanying drawing, the embodiment of cleaning method of the present invention is described, figure 1It is a graph for explaining the cleaning method of this embodiment, and the horizontal direction in this figure represents the time axis. In addition, the symbol A in the figure represents the flow velocity of the cleaning liquid sprayed to the object to be cleaned, and the part indicated by the oblique line in the figure refers to the liquid amount of the cleaning liquid sprayed on the object to be cleaned.

[0039] That is, the cleaning method of this embodiment is characterized in that a predetermined amount of cleaning liquid is continuously sprayed to the object to be cleaned at ordinary times, and with this situation, the fluctuations are strengthened and weakened for the steady continuous flow of the continuously sprayed cleaning liquid. deal with.

[0040] In addition, in this embodiment, according to the flow rate of 14-17m / sec, the h...

Embodiment 2

[0061] Another embodiment of the cleaning method of the present invention is described below with reference to the accompanying drawings, Figure 13 It is a graph for explaining the cleaning method of this embodiment. In the figure, the horizontal direction is the time axis.

[0062] In addition, in the cleaning method of this embodiment, a specified amount of cleaning liquid can be continuously sprayed to the object to be cleaned by high pressure at ordinary times, and in parallel with the spraying, another system of nozzles can be used to spray the cleaning liquid to the object by high pressure. The cleaning liquid that has been subjected to the treatment of increasing and decreasing fluctuations is blown onto the object to be cleaned.

[0063] which is, Figure 13 The symbol B among them represents the cleaning liquid that is sprayed continuously, and the symbol A represents the cleaning liquid that is sprayed according to the way of strengthening and weakening the fluctu...

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Abstract

The invention provides a cleaning method and a cleaning liquid feeding deviece for carrying out the method. wherein the method prevents a film forming of a cleaning liquid on a material to be washed, and at the same time, enables also the prevention of the back flow of the cleaning liquid and foreign materials on the material to be washed. In the cleaning method which sprays the cleaning liquid continuously to the material to be washed, a high-pressure cleaning liquid is sprayed to the material to be washed continuously in a flow rate of 14-17 m / sec, and at the same time, the flow rate of the cleaning liquid sprayed continuously increases up to 100-120 m / sec in a cycle of 20-50 c / sec to add strength and weakness to the cleaning liquid. Accordingly, since the strength and weakness added to the cleaning liquid blows out the cleaning liquid sprayed to the material to be washed, no coating film of the cleaning liquid is formed on the material to be washed. Further, since the cleaning liquid is sprayed continuously to the material to be washed, it is possible to flow the cleaning liquid bumped against the material to be washed on the material to be washed always together with the removed foreign materials, and to prevent the back flow on the material to be washed.

Description

technical field [0001] The present invention relates to cleaning methods used in manufacturing steps of liquid crystal panel manufacturing, PDP panel manufacturing, organic EL panel manufacturing, FED panel manufacturing, printed circuit board manufacturing, semiconductor manufacturing, film manufacturing, plate manufacturing, and other electronic equipment parts. Implement the cleaning liquid supply device of this method, more specifically, the present invention relates to following cleaning method and the cleaning liquid supply device that implements this method, it is characterized in that to the object to be cleaned while spraying high-pressure cleaning liquid continuously The cleaning liquid is strengthened and weakened, and while continuously spraying high-pressure cleaning liquid to the object to be cleaned, the cleaning liquid that has been strengthened and weakened is sprayed to the object in parallel with the continuous spraying of the cleaning liquid. Cleaning. Ba...

Claims

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Application Information

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IPC IPC(8): B08B3/02B08B3/00B08B11/00
CPCH01L21/02057H01L21/67057
Inventor 小林芳树安川雅彦
Owner XEVIOS CORP
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