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Method of forming thin film and method of fabricating oled

A thin-film and organic technology, applied in the field of thin-film formation, can solve problems such as large amounts of energy and substrate degradation

Active Publication Date: 2006-08-09
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

That is, a large amount of energy is required to form a thin film such as Al, and substrate degradation occurs due to a high-temperature process

Method used

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  • Method of forming thin film and method of fabricating oled
  • Method of forming thin film and method of fabricating oled
  • Method of forming thin film and method of fabricating oled

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Experimental program
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Embodiment Construction

[0018] Figure 1A is a schematic plane showing a method of forming a thin film according to the present invention, and Figure 1B is a sectional view showing an evaporation source used in forming a thin film according to the present invention.

[0019] see Figure 1A and 1B , illustrates a method of forming a thin film according to the present invention using a vacuum deposition method. A vacuum deposition apparatus 100 for a vacuum deposition method includes a vacuum deposition chamber 110, an evaporation source 120, a substrate 130, and the like. The evaporation source 120 may consist of an evaporation unit 120a that evaporates a desired material to be deposited on the substrate 130, and a nozzle unit 120b that sprays gas evaporated from the evaporation unit 120a.

[0020] A vacuum exhaust system (not shown) connected to the vacuum deposition chamber 110 is existing for maintaining the inside of the vacuum deposition chamber 110 in a constant vacuum state. Next, the furna...

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PUM

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Abstract

A method of forming a thin film and a method of fabricating an organic light emitting display device are provided. The method includes depositing a film formation material mixed with a deposition material and an additive material to form the thin film, and the additive material has a eutectic melting point with the deposition material. Accordingly, it is possible to form the thin film at a quite lower temperature compared to a conventional case of forming the thin film using only a deposition material.

Description

technical field [0001] The present invention relates to a method of forming a thin film and a method of manufacturing an organic light-emitting display device (OLED), and more particularly, to a method of forming a thin film at a low temperature by depositing and depositing an additive material having a eutectic point, and manufacturing OLED method. Background technique [0002] Generally, methods of forming a thin film on a substrate include physical vapor deposition (PVD) methods such as vacuum deposition methods, ion plating methods, and sputtering methods, and chemical vapor deposition (CVD) methods using gas reactions, and the like. Among these methods, the vacuum deposition method is mainly suitable for forming thin films such as organic layers and electrodes or the like in OLEDs. [0003] The vacuum deposition method is a method in which an evaporation source is disposed in a lower portion of a vacuum deposition chamber and a substrate for thin film formation is disp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/3205H01L21/82H05B33/10
CPCH01L51/5221C23C14/243H01L51/0003H01L51/0021C23C14/14H10K71/12H10K71/60H10K59/8052H05B33/10H10K50/82
Inventor 金度根金汉基许明洙
Owner SAMSUNG DISPLAY CO LTD