Monitoring marking layout for microlens baking process

Abstract

This invention relates to a monitoring marking layout for microlens baking process. Wherein, it comprises: two vertical-line pattern paralleled with each other, and one horizontal-line pattern connected to the vertical to define a pointer path and fluidize the vertical pattern to lead the horizontal pattern fusing along the path and forming design; then, uses the design to decide whether there once a roasting process to the microlens.

Description

technical field [0001] The invention relates to the manufacture of microlenses, in particular to a monitoring mark for the baking process of the microlenses, which is made on the cutting line and can be used to evaluate whether the microlens array has been baked and the quality of the baking. Background technique [0002] As known to those in the industry, microlens technology has been widely used in many optoelectronic products currently on the market, such as digital cameras and digital video cameras. The purpose of using the microlens is to control the direction of the light, so that the light can be gathered in the sensing area of ​​the light sensing chip. [0003] A digital camera usually includes a stacked color filter array (CFA) and a charge-coupled device (CCD) or complementary metal oxide semiconductor (CMOS) image sensor, wherein the color filter array includes three (R / G / B) or above staggered filter channels, each filter channel only allows light of a specific ...

AI Technical Summary

Problems solved by technology

However, this method is not only inefficient, but also as the thickness of the microlens gradually shrinks, it becomes more and more difficult to distinguish the reflective pattern with the naked eye, and the error is also greater

In addition, the current technology cannot evaluate the flow of the photoresist after baking and the quality of the microlens array

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