Multi-level redistribution layer traces for reducing current crowding in flipchip solder bumps
The multi-level redistribution layer trace with extended I/O pads and optional slots addresses current crowding issues in microelectronic packaging, improving reliability by diffusing current flow and reducing peak density in solder bumps, thus extending the service life of integrated circuits.
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[0026] One of the limiting factors of the service life of a microelectronic package is electromigration. Electromigration is the mass transport of atoms in die interconnects and solder bumps of a microelectronic package. Since the invention of the first integrated circuits in the 1960's, electromigration has been a major problem. As package size and I / O pad dimensions decrease with higher density technologies, reliability may be comprised if measures are not taken to mitigate electromigration. Also, with the implementation of a metal redistribution layer made of copper instead of aluminum, the maximum current density capability of the metal redistribution layer doubles from about 4×10−3 amperes per square micron to about 8×10−3 amperes per square micron. The higher current density in the metal redistribution layer results in a correspondingly higher current density in the die interconnects and the solder bumps.
[0027] Solder bumps are especially prone to failures due to high current...
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