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Positioning system and method for precise stage and pattern used thereof

Inactive Publication Date: 2013-08-15
NAT SYNCHROTRON RADIATION RES CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0010]It is an aspect of the present invention to provide a positioning system and method for a precise stage and pattern used thereof, which can be applied to multi-dimen

Problems solved by technology

Generally, when a high precision stage is rotating or multi-axis positioning, it may lead to a problem of mechanical drift.
The state-of-art solutions and disadvantages thereof are described below:(1) Using an optical interferometer to detect precision movement of the moving stage for high precision positioning: it cannot be arranged on the rotating axis of the moving stage.(2) Using an optical scale for calibration: precision thereof

Method used

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  • Positioning system and method for precise stage and pattern used thereof
  • Positioning system and method for precise stage and pattern used thereof
  • Positioning system and method for precise stage and pattern used thereof

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Embodiment Construction

[0026]The detail description is provided below and the preferred embodiments described are only for the purpose of description rather than for limiting the present invention.

[0027]FIG. 1 is a schematic diagram illustrating the structure of the positioning system for a precise stage according to an embodiment of the present invention. As shown in FIG. 1, the positioning system for a precise stage 10 comprises a designed pattern placed on a moving stage 14. Referring to FIG. 2, a schematic diagram illustrating the designed pattern according to one embodiment of the present invention, the designed pattern 12 comprises a plurality of gradually wider marks arranged radially; in one embodiment, there are four gradually wider marks, but not limited to this. The gradually wider mark is a fan-shaped mark 121 and there is a space 122 between two adjacent fan-shaped marks; an electron beam column 16 is arranged above the moving stage 14 for generating a focused electron beam 18 and using a sca...

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Abstract

A positioning system for precise stage is provided. It includes a designed pattern on a stage; an electron beam column generating a focused electron beam to scan the designed pattern and produce electron signal; an electron detection unit to detect the electronic signal; and a control unit converting the electron signal to a clock signal to determine the relative position of the electron beam column and the designed pattern, so as to adjust the displacement of the stage. A nanometer scale positioning method for a precise stage is provided, which can resolve the problem of mechanical drift of the stage when the stage is multi-axis positioning or rotating.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a positioning system and method for a precise stage and more particularly to a positioning system and method for a precise stage by means of electron beam scanning.[0003]2. Description of the Prior Art[0004]With requirements of high precision for industrial machinery and measuring instruments, development of precision machinery, semiconductor industry, micron technology or nanotechnology all emphasize on micronization and precision, wherein positioning technique and instruments with high precision are necessary for processing machinery, semiconductor fabrication and electronic information device.[0005]Generally, when a high precision stage is rotating or multi-axis positioning, it may lead to a problem of mechanical drift. The state-of-art solutions and disadvantages thereof are described below:[0006](1) Using an optical interferometer to detect precision movement of the moving stage for...

Claims

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Application Information

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IPC IPC(8): H01J37/28H01J37/02
CPCH01J37/20H01J37/244H01J37/28H01J2237/20292H01J2237/24578H01J37/3045
Inventor YIN, GUNG-CHIANLEE, TE-HUI
Owner NAT SYNCHROTRON RADIATION RES CENT