Substrate treating apparatus

Abstract

A substrate treating apparatus for treating substrates with a treating liquid is disclosed. The apparatus includes a treating tank for storing the treating liquid, and treating the substrates as immersed in the treating liquid, a chamber surrounding the treating tank, a supply device for supplying an inert gas containing an organic solvent into the chamber, a lift mechanism vertically movable, while supporting the substrates, between a process position in the treating tank and a wait position above the treating tank and inside the chamber, a tank temperature control device for controlling temperature of the treating tank, a chamber temperature control device for controlling temperature of the chamber, and a control device for causing the tank temperature control device and the chamber temperature control device to perform heating treatment at least while the inert gas containing the organic solvent is supplied from the supply device.

Description

BACKGROUND OF THE INVENTION[0001](1) Field of the Invention[0002]This invention relates a substrate treating apparatus for treating substrates such as semiconductor wafers or glass substrates for liquid crystal displays (hereinafter called simply substrates) with treating liquids such as deionized water and chemicals. More particularly, the invention relates to a technique for performing drying treatment of substrates by supplying an inert gas such as nitrogen gas containing an organic solvent such as isopropyl alcohol.[0003](2) Description of the Related Art[0004]A conventional substrate treating apparatus of this type includes a treating tank for storing treating liquids and receiving substrates for treatment, a chamber surrounding the treating tank, a lift mechanism for supporting the substrates and vertically movable between a process position inside the treating tank and a wait position above the treating tank and inside the chamber, and nozzles disposed in upper positions insi...

AI Technical Summary

Benefits of technology

[0008]This invention has been made having regard to the state of the art noted above, and its object is provide a substrate treating apparatus that can prevent condensation of an organic solvent such as isopropyl alcohol, thereby avoiding insufficient drying performance.

[0010]According to this invention, the control device causes the tank temperature control device and the chamber temperature control device to perform heating treatment at least while the inert gas containing the organic solvent is supplied from the supply device. It is thus possible to prevent the organic solvent supplied into the chamber from condensing in the chamber and treating tank. As a result, the concentration of the isopropyl alcohol in the chamber does not decrease, thereby avoiding insufficient drying performance.

[0014]Once the treating liquid stored in the treating tank is heated for treatment of the substrates, it will take a very long time to cool the liquid by relying on natural heat dissipation. The cooling of the treating liquid may be assisted by cooling the treating tank with the tank temperature control device and chamber temperature control device, thereby lowering the temperature of the treating liquid quickly.

Problems solved by technology

In the conventional apparatus, when the treating tank stores deionized water, the treating tank itself is at a low temperature, resulting in a drawback of the isopropyl alcohol contained in the inert gas condensing on the treating tank.

Such condensation lowers the density of the isopropyl alcohol supplied into the chamber, so that the isopropyl alcohol cannot fully replace the deionized water adhering to the substrates, and thus a possibility of insufficient drying performance.

When not only the treating tank but the chamber itself lowers in temperature, the isopropyl alcohol may condense in the chamber, causing the same problem as above.

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