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Manufacturing method of liquid crystal substrate and manufacturing device of liquid crystal substrate

A technology for a liquid crystal substrate and a manufacturing method, which is applied in the field of manufacturing devices for liquid crystal substrates, can solve the problems of uneven thermal conductivity, uneven temperature distribution, uneven drying of alignment film ink, and the like

Inactive Publication Date: 2008-03-26
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, in the conventional liquid crystal substrate manufacturing method, as shown in FIG. 7, since the thickness of the cross-section of the accompanying table 20 is not uniform, the thermal conductivity of the heat generated by the heating plate 10 becomes non-uniform.
Therefore, in the manufacturing method of the liquid crystal substrate in the past, as shown in FIG. 8, since the substrate 30 1 ~30 25 The temperature distribution in the center is uneven, so there are problems of uneven drying of the orientation film ink and low yield

Method used

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  • Manufacturing method of liquid crystal substrate and manufacturing device of liquid crystal substrate
  • Manufacturing method of liquid crystal substrate and manufacturing device of liquid crystal substrate
  • Manufacturing method of liquid crystal substrate and manufacturing device of liquid crystal substrate

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Embodiment

[0021] FIG. 1 is a plan view showing the configuration of an embodiment of the present invention. Fig. 2 is a sectional view along line B-B' shown in Fig. 1 . A method for manufacturing a liquid crystal substrate and an apparatus for manufacturing a liquid crystal substrate will be described below. In FIGS. 1 and 2 , parts corresponding to those in FIGS. 5 and 6 are denoted by the same reference numerals, and descriptions thereof are omitted. In FIGS. 1 and 2 , instead of the pallet 20 shown in FIGS. 5 and 6 , a grid frame 60 and a pallet base 70 are provided.

[0022] The grid frame 60 and the accompanying workbench base 70 are made of materials with high thermal conductivity such as aluminum to form the accompanying workbench. The grid frame 60 is a grid-shaped frame, and is detachably attached to the pallet base 70 . The grill frame 60 is formed as a matrix-like receiving portion 61 1 ~61 25 , is set on the pallet base 70 (see FIG. 2 ). The pallet base 70 is a plate-l...

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Abstract

The method for manufacturing the liquid crystal substrate includes: a step to apply the alignment layer ink to a plurality of substrates 30<1>-30<25> attachably and detachably mounted on a palette base part 70 with uniform thickness contained in a matrix shaped grid frame; a step to detach the grid frame 60 from the palette base part 70; and a step to heat the plurality of substrates 30<1>-30<25> via the palette base part 70, and the alignment layer ink applied to the respective substrates 30<1>-30<25>is dried with uniform heat via the palette base part 70. The method of the invention improves the yield.

Description

technical field [0001] The present invention relates to a manufacturing method of a liquid crystal substrate and a manufacturing device of a liquid crystal substrate, and particularly relates to a manufacturing method of a liquid crystal substrate and a manufacturing device of a liquid crystal substrate capable of improving yield. Background technique [0002] In the past, a liquid crystal substrate was manufactured by forming an alignment film on the substrate after applying an alignment film ink to the substrate by an inkjet method (see Patent Document 1). FIG. 5 is a plan view illustrating a conventional method of manufacturing a liquid crystal substrate. Fig. 6 is a sectional view along the line A-A' shown in Fig. 5 . In these figures, the heating plate 10 has a substrate 30 arranged in a matrix. 1 ~30 25 The alignment film ink coated on the top is dried to form the heating function of the alignment film. [0003] Accommodating parts 21 are formed in a matrix form on...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/13G02F1/1337B05C9/14G02F1/1333G09F9/00G09F9/35
CPCG02F1/1337G02F1/13
Inventor 岩田裕二
Owner SEIKO EPSON CORP