Grating ion beam etching optical on-line detection device and detection method

Abstract

The invention relates to the diffraction optics, micro-production and other scientific fields, in particular to an on-line optical scanning detection device and a method in scanning of an ion beam etching. The device comprises an ion beam etching workbench, an optical plane reflection mirror which is arranged in a vacuum chamber of an iron beam etching system and a laser, a photoelectric detector,a digital voltmeter and a computer data collection system which are arranged at the outside of the vacuum chamber, the position of the laser can ensure that an incident light beam returns to the reflection mirror along the original path after passing through the reflection mirror and being diffracted by an grating to be etched, thus being received by the photoelectric detector which is arranged on the diffraction direction; the photoelectric detector carries out the analog-to-digital conversion of the light signal by the digital voltmeter and then outputs to the computer data collection system for carrying out the output display and storage. The detection method thereof is to determine the end point of etching of the grating which is etched according to the shape of a minus 1 level diffraction intensity one-dimensional distribution curve which is displayed on a computer display. The method takes comprehensive consideration of the grating diffraction intensity one-dimensional spatial distribution at different times, which can precisely control the best cut-off time of etching of the grating.

Description

technical field [0001] The invention relates to the scientific fields of diffraction optics and microfabrication, and in particular to an on-line optical scanning detection device and method for scanning ion beam etching of a diffraction grating. Background technique [0002] Ion beam etching technology has played an important role in the fabrication of diffraction gratings, binary optical elements, and microstructures. At present, many ion beam etching processes still control the etching depth of the material through the etching time. The premise of controlling the etching time in this way is that the etching rate of the material is close to a constant in different etching experiments. However, due to the complexity of the ion beam etching process of materials, many uncertain factors will affect the etching characteristics of materials, making the actual etching rate unstable. If the etching depth is simply controlled by the etching time, it is impossible to dynamically an...

AI Technical Summary

Problems solved by technology

[0005] Aiming at the problems existing in the prior art, the present invention provides a scanning ion beam etching and optical online detection device and scanning detection method, through the online detection of the one-dimensional spatial distribution of grating diffraction intensity with the change of etching time, to solve the problem of precise control Grating Etch Time End Issues

Images