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Plasma processing device and medium window thereof

A processing device and plasma technology, which is applied in the field of microelectronics, can solve the problems of large consumption, high cost, and increased use cost of plasma processing devices, and achieve the effect of reducing consumption and reducing customer use costs

Active Publication Date: 2010-03-24
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to its high cost and large consumption, frequent replacement of the dielectric window significantly increases the cost of using the plasma processing device

Method used

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  • Plasma processing device and medium window thereof
  • Plasma processing device and medium window thereof
  • Plasma processing device and medium window thereof

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Experimental program
Comparison scheme
Effect test

Embodiment approach

[0037] In the first specific implementation manner, the dielectric window 2 provided by the embodiment of the present invention has a plate structure, and is usually made of dielectric materials such as quartz, ceramics, and SiC. The dielectric window 2 is arranged on the top of the plasma processing device and supported by the sidewall of the plasma processing device. The shape of the cross section of the dielectric window 2 is generally set to be circular, of course, it can also be set to other shapes when necessary.

[0038] The dielectric window 2 includes an outer peripheral portion 21 which is supported by the side walls of the above-mentioned plasma processing apparatus. The middle part of the outer peripheral part 21 has a first inner cavity 211 in which the first central part 22 is detachably mounted in a conventional manner.

[0039] The cross-section of the first cavity 211 is preferably circular, and correspondingly, the cross-section of the first central portion ...

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Abstract

The invention discloses a medium window of a plasma treatment device and comprises an external circumference part (22) supported by the sidewall of the plasma treatment device; the external circumference part (22) is provided with a first cavity (211); and a first central part (22) can be removably arranged in the first cavity (211) and keeps gas seal with the cavity (211). The invention also discloses a plasma treatment device containing the medium window. The medium window is provided with a split structure; when the first central part (22) can not be used due to corrosion, only the first central part (22) needs to be replaced, and the external circumference part (22) can continue to be used. Therefore, in the using process of the plasma treatment device, the consumption of the medium window can be significantly reduced, and the using cost of the plasma processing device customers can also be significantly reduced.

Description

technical field [0001] The invention relates to the technical field of microelectronics, in particular to an induction coil coupled plasma processing device. The invention also relates to a dielectric window of an induction coil coupled plasma processing device. Background technique [0002] Inductive coil coupled plasma processing device is a processing equipment widely used in the field of microelectronics technology. [0003] Please refer to figure 1 and figure 2 , figure 1 It is a schematic structural diagram of a typical inductive coil coupled plasma processing device in the prior art; figure 2 for figure 1 Schematic diagram of the structure of the medium window. [0004] An inductive coil coupled plasma processing device (hereinafter referred to as a plasma processing device) 1 includes a side wall 11, which is generally circular, and a reaction chamber 12 is formed therein. The top of the reaction chamber 12 has a dielectric window 13 as its top wall, and an ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01J37/32H05H1/46C23C16/44
Inventor 赵强
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD