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Method for improving color resist characteristics and color resist agent

A technology of color photoresist and photoresist, which is applied in the direction of photosensitive materials, optics, and optomechanical equipment used in optomechanical equipment. It can solve problems affecting color filters, increase the percentage of residual film rate, and increase the development speed. Effect

Inactive Publication Date: 2007-08-01
ECHEM SOLUTIONS
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  • Abstract
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  • Application Information

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Problems solved by technology

[0004] Therefore, the characteristics of the color photoresist, such as the residual film rate percentage, development speed, and developing pattern contrast, will directly affect the quality and production capacity of the color filter; in addition, because the general mixture cannot easily be formed from a single component structure Predict the properties that should be possessed. Although the current known negative photoresist in the industry has only a slight change in composition, it can produce completely different properties. Therefore, how to improve the relevant characteristics of color photoresist according to the actual application requirements It is necessary to gradually change the composition structure with similar properties, explore the structure that may have the required characteristics, and then determine whether the properties of each component can make the final color photoresist meet the actual use requirements

Method used

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  • Method for improving color resist characteristics and color resist agent
  • Method for improving color resist characteristics and color resist agent
  • Method for improving color resist characteristics and color resist agent

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Embodiment Construction

[0007] In order to make your examiner understand the main technical content and implementation mode of the present invention, the description is as follows with the help of drawings:

[0008] The "method for improving the characteristics of color photoresist and the color photoresist" of the present invention can effectively improve the development speed, the contrast of the developing pattern, and the percentage of remaining film by changing the monomer components of the color photoresist; The entire color photoresist is composed of (A) organic or inorganic pigments (Pigment) of black, red, green and blue primary colors; (B) resin (Resin); (C) water-soluble monomer (water-soluble monomer) and non- Water-insoluble monomer (water-insoluble monomer) mixed; (D) photoinitiator (Photoinitiator); (E) solvent (Solvent), together constitute a color photoresist (Color photo resist).

[0009] Among them, the pigment (Pigment) can optionally be CI pigment yellow (1, 3, 11, 12, 13, 14, 15...

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Abstract

This invention relates to one method to add water-soluble monomer and water-insoluble monomer mixture into color resistance with pigment to improve light resistance micro image process speed to get same or better resin film percentage, wherein, the water-soluble monomer and water-insoluble monomer mixture to improve developing pattern contrast.

Description

technical field [0001] The invention relates to the modification technology of the color photoresist, so as to obtain a color photoresist that effectively improves the development speed, the contrast of the developing pattern, and the percentage of residual film. Background technique [0002] Generally, photoresists that decompose after exposure to ultraviolet (UV) are called "positive photoresists", on the contrary, those that will harden and polymerize after exposure are "negative photoresists", and color photoresists are negative photoresists. It is also a key material for the colorization of LCD flat-panel displays; the known method of making color filters is implemented on a glass substrate with a pigment dispersion method, and (A) organic pigments of three primary colors (A) black, red, green, and blue ( Pigment); (B) resin (Resin); (C) water-insoluble monomer (water-insoluble Monomer); (D) photoinitiator (Photo initiator); (E) solvent (Solvent) mixed to produce colore...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/033
Inventor 郭光埌戴伟仁温世豪
Owner ECHEM SOLUTIONS