Thiol compound, and photosensitive composition and black matrix resist composition using the compound

A technology of thiol compound and photosensitive composition, applied in the fields of photopolymerization initiator system, black matrix resist composition, and alkali-developable photosensitive composition, can solve the problem of low performance of thin line pattern line width and poor curing. Sufficient, radiation light can not reach enough depth and other problems

Inactive Publication Date: 2010-05-12
SHOWA DENKO KK
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] (1) Cannot obtain enough energy to initiate photopolymerization;
[0009] (2) Storage stability cannot be obtained;
[0010] (3) Due to the thickness of the desired cured product, the radiation light cannot reach deep enough in it, resulting in insufficient curing;
[0012] (5) Under alkaline development, the performance of retaining the line width of thin line patterns is low
[0017] However, since the polyfunctional thiol compound which has been proposed before is aliphatic as the polyol component contained therein as its basic skeleton, there is a problem in the photocured product obtained by using the compound. Alkali developability, the line width of thin line patterns becomes smaller, that is, there is a problem of insufficient development latitude, although the sensitivity of the composition can be improved

Method used

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  • Thiol compound, and photosensitive composition and black matrix resist composition using the compound
  • Thiol compound, and photosensitive composition and black matrix resist composition using the compound
  • Thiol compound, and photosensitive composition and black matrix resist composition using the compound

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Embodiment

[0296] Hereinafter, the present invention will be described in further detail with reference to a synthesis example of a thiol compound, a free radical generating agent, and a binder resin having a carboxyl group on its side chain, the preparation of a black pigment dispersion solution, and the present invention will be given Examples and comparative examples of inventive photosensitive compositions and black matrix resist compositions are given to further describe the present invention. However, the present invention is not limited to these Examples. In addition, in an Example, "part" shows a mass part, and "%" shows a mass %.

[0297] (1) Synthetic Examples of Thiol Compounds

[0298] Synthetic Example 1: Synthesis of 2,2-bis{4-(3-mercaptobutyryloxyethoxy)phenyl}propane (compound of formula (10), wherein m is 1) (BAEMB)

[0299]

[0300] In a 200-ml volume eggplant-shaped flask, 40 g (hydroxyl equivalent: 246 meq) of 2,2-bis{4-(2-hydroxyethoxy)phenyl}propane (BA-2, Nipp...

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Abstract

The invention is related to a thiol compound represented by formula (1), production method thereof, and a photosensitive composition and a resist composition for black matrix for color filters which use the thiol compound and are excellent in sensitivity and can keep the line width in patterns unchanged, i. e. attain an excellent developing latitude. (All the symbols have the same meanings as defined in the Description.

Description

[0001] Cross References to Related Applications [0002] This application is an application filed pursuant to 35 U.S.C. part 111(a), which requires filing pursuant to the terms of 35 U.S.C. part 111(b) on November 4, 2004, pursuant to 35 U.S.C. Benefit of U.S. Provisional Application Serial Nos. 60 / 624,530 and 60 / 624,531 filed on . technical field [0003] The present invention relates to a novel thiol compound having a bisphenol skeleton, a preparation method thereof, and an alkali-developable photosensitive composition and a black matrix resist composition for a color filter using the compound. More specifically, the present invention relates to a novel thiol compound having a bisphenol skeleton, a photosensitive composition using the compound, and a black matrix resist composition for a color filter, the composition containing: (A) A photopolymerization initiator system comprising the compound; (B) a binder resin having a carboxyl group; and (C) a compound having an ethyle...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C323/52G03F7/00G03F7/027
CPCC07C323/52C07D233/20G03F7/027
Inventor 镰田博稔大西美奈室伏克己
Owner SHOWA DENKO KK
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