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Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method

A vacuum deposition and vacuum technology, applied in chemical instruments and methods, vacuum evaporation plating, ion implantation plating, etc.

Inactive Publication Date: 2010-09-29
阿顿公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, here the reservoir can only be refilled after opening the tight lid of the secondary housing, which means that the unit of the secondary / primary housing is exposed to air

Method used

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  • Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method
  • Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method
  • Device for vacuum deposition with recharging reservoir and corresponding vacuum deposition method

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Embodiment Construction

[0036] figure 1 The apparatus for vacuum deposition of thin films is schematically shown. It may involve the deposition of organic material or material under strong vapor pressure, hereafter referred to by the term charge. The device is used, for example, for the production of electroluminescent diodes (OLEDs) based on organic materials. The charge is solid under standard conditions of temperature and pressure.

[0037] The device comprises a housing 1 suitable for receiving a substrate 2 extending horizontally in the upper part of the housing 1 . The bottom of the housing comprises a cylindrical injection chamber 5 open at the top of the housing and closed at the bottom by a wall 141 .

[0038] The injection unit 3 is adapted to inject the charge into the housing 1 in the form of a steam beam extending substantially in the shape of a cone, the size of which is such that the base material 2 substantially forms the base of the cone.

[0039] The injection unit 3 comprises a...

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PUM

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Abstract

The invention concerns a device for vacuum deposition comprising a chamber (1) adapted to receive a substrate (2) to be vacuum-treated and at least one injector (110) for generating a molecular steam jet of organic material. The injector, provided with a valve (20), runs through the base of the chamber and comprises an end piece (120) adapted to receive a removable reservoir (10) containing said organic material. A main heating device (40) heats the reservoir and secondary heating devices (30, 40) heat the injector so as to establish a temperature gradient.

Description

technical field [0001] The present invention relates to the field of vacuum deposition. More specifically, the present invention relates to the vacuum deposition of thin films of organic materials, for example for the production of electroluminescent diodes (OLEDs) based on organic materials. Background technique [0002] The structure of the basic unit of an OLED device consists of a stack of very fine organic layers sandwiched between a transparent anode and a metal cathode. These organic layers are prepared by evaporation and vacuum deposition of the material or materials constituting the layer. [0003] One problem posed by this production process is the introduction of the enclosure in vacuum with the substrate containing the evaporated organic material to be treated. [0004] For example US Patent No. US 4,553,022 describes a known device for carrying out the method comprising a thermal effusion chamber consisting of a crucible containing the organic material to be e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/26C23C14/24
CPCC23C14/26C30B23/06C23C14/243C30B29/54C23C14/246C30B23/066C23C14/24
Inventor J-L·居约克斯F·施特梅伦P·布沙伊卜
Owner 阿顿公司