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Pattern writing apparatus and pattern writing method

A pattern and main scanning direction technology, which is applied to the printing device, the exposure device of the photo-engraving process, the photo-engraving process of the pattern surface, etc., can solve the problem of high sensitivity

Active Publication Date: 2008-05-07
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the technology disclosed in Document 1, light from the micromirror group of the DMD is introduced into the overlapping portion of the area irradiated with light by the preceding main scan and the area irradiated with light by the subsequent main scan. The irradiated area group is painted twice, and its light sensitivity is higher than other areas to an unacceptable level

Method used

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  • Pattern writing apparatus and pattern writing method
  • Pattern writing apparatus and pattern writing method
  • Pattern writing apparatus and pattern writing method

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Embodiment Construction

[0041] 1 is a diagram showing the structure of a pattern drawing device 1 according to a first embodiment of the present invention. The pattern drawing device 1 irradiates light on a photosensitive material as a photoresist film on a substrate 9 to draw a pattern on the photosensitive material. The pattern drawing device 1 is provided with a light irradiation unit 2 having two irradiation heads 20 , and each irradiation head 20 is connected to a light source unit 21 . The relative positions of the two irradiation heads 20 are fixed to each other, and the irradiation head moving mechanism 32 as a linear motor is driven to move as a whole along the X direction in FIG. 1 . In the description of FIG. 1 and the following, the number of irradiation heads 20 is set as two (or focus on two) for description, but the number of irradiation heads 20 may also be set to three or more.

[0042] Below the light irradiation part 2, the stage 11 holding the substrate 9 and the linear motor that...

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Abstract

Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.

Description

technical field [0001] The present invention relates to a pattern drawing device and method for drawing a pattern by irradiating spatially modulated light onto a photosensitive material. Background technique [0002] Conventionally, it is known that a technique for drawing a fine pattern on a photosensitive material by scanning spatially modulated light on the photosensitive material is proposed. As a spatial light modulator, a DMD (Digital Micromirror Device) using a micromirror group has been proposed. Program. [0003] For example, JP Unexamined Patent Publication No. 2004-326076 (document 1) discloses such a technique: the arrangement of the irradiation area group on the photosensitive material that introduces the light from the micromirror group of the DMD is inclined with respect to the main scanning direction. In this state, the main scan is performed on the irradiation area group to improve the definition. In this device, each time the main scan is performed on the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F7/00G03B27/54
CPCG03F7/70791G03F7/70291G03F7/20
Inventor 久冈胜幸城田浩行
Owner DAINIPPON SCREEN MTG CO LTD