Substrate processing sytstem and apparatus

A substrate processing device, substrate processing system technology, applied in the direction of optics, instruments, discharge tubes, etc., can solve the problems of uneven distribution of plasma, side wall peeling, generation of particles, etc.

Inactive Publication Date: 2008-12-03
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is still the problem of uneven distribution of plasma in the chamber space
[0010] In addition, when the movable insulating plate moves, there is a problem that the side wall attachment is peeled off due to the impact of the movement, and particles are generated.

Method used

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  • Substrate processing sytstem and apparatus
  • Substrate processing sytstem and apparatus
  • Substrate processing sytstem and apparatus

Examples

Experimental program
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Embodiment Construction

[0033] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0034] First, a substrate processing system according to an embodiment of the present invention will be described.

[0035] figure 1 It is a plan view schematically showing the configuration of the substrate processing system according to the embodiment of the present invention. This substrate processing system is a multi-chamber type substrate processing system for etching a glass substrate for FPD.

[0036] exist figure 1 Among them, the substrate processing system 10 includes: a transfer chamber 11 arranged in the center; a load lock chamber 12 connected to the transfer chamber 11; device); on the opposite side with the transfer chamber 11, the arm support platform 14 connected to the load lock chamber 12;

[0037] One box 15 is used to store a plurality of unprocessed glass substrates (hereinafter simply referred to as “substrates”) G, and the other box 15 is ...

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PUM

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Abstract

The invention provides a base plate process system and a base plate process device, capable of making plasmas be equally distributed in space of a containing room without generating particles. The base plate process system (10) comprises three plasma process devices (13) and carrying rooms (11) for carrying in and out glass base plates (G) relative to each plasma process device (13) which has a quadrate chamber (18) for containing the base plates (G). Only lateral walls (18a) of the chambers (18) are connected with the carrying rooms (11). Carrying ports (13) communicated with the carrying rooms (11) are mounted on the lateral walls (18a). Opening parts (32) are mounted on lateral walls (18b) relative to the lateral walls (18a). The carrying ports (13) have an opening shape similar to the same of the opening parts (32).

Description

technical field [0001] The present invention relates to a substrate processing system and a substrate processing device, and particularly relates to a substrate processing system having a substrate processing device for performing plasma processing on a substrate for a liquid crystal display. Background technique [0002] As for the plasma processing apparatus 60 (substrate processing apparatus) that etches a glass substrate for FPD (Flat Panel Display: flat panel display), as Figure 6 As shown, it includes: a chamber 61 (accommodating chamber) for accommodating a glass substrate (hereinafter referred to as "substrate") G; a lower electrode 62 for placing the substrate G and connecting to a high-frequency power source; The shower head 63 of the upper electrode facing the lower electrode 62 . In this plasma processing apparatus 60 , the processing gas supplied to the inner space of the chamber 61 is excited by a high-frequency electric field to generate plasma, and the subst...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00G02F1/1333H01J37/32H05H1/46
CPCG02F1/1303H01J37/32091H01L21/67745
Inventor 佐藤亮齐藤均
Owner TOKYO ELECTRON LTD
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