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Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof

A grating structure, embedded technology, used in polarizing elements, microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problems of inability to use industrial applications, low production efficiency, small area, etc. Transmission efficiency, simple manufacturing process, and the effect of protecting the metal layer

Active Publication Date: 2011-05-04
SUZHOU UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The grating with such a small processing cycle can use electron beam exposure technology and ion etching technology. The main problems are: low production efficiency, small area (a few centimeters), and high cost. It cannot be used in industrial applications at present.

Method used

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  • Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof
  • Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof
  • Sub-wave length embedded type grating structure polarizing sheet and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] See attached figure 2 , is a schematic diagram of a subwavelength embedded grating structure polarizer.

[0042] The transparent substrate 22 is made of glass or plastic film with a thickness of 12-150um. The plastic can be polycarbonate (PC), polyvinyl chloride (PVC), polyester (PET), polymethylmethacrylate (PMMA) or polypropylene (BOPP).

[0043] The refractive index of the high refractive index medium layer 23 is greater than that of the substrate.

[0044] High refractive index medium layer 23 can be TiO 2 、 Ta 2 o 5 , ZnS and so on.

[0045] The metal layer 24 can be a gold, silver, copper, aluminum layer.

[0046]The dielectric grating 25 is made of plastic, which can be polycarbonate (PC), polyvinyl chloride (PVC), polyester (PET), polymethyl methacrylate (PMMA) or polypropylene (BOPP).

[0047] The cover layer 26 may be CaF 2 Or plastic or resin coating.

[0048] Wherein, the period p of the dielectric grating is less than or equal to 250nm;

[0049] ...

Embodiment 2

[0059] see figure 2 , changing the refractive index of the high refractive index medium layer, the refractive index of the dielectric covering layer, and the height of the metal layer in Embodiment 1. The refractive index of the high refractive index medium layer 23 is 2.2, the dielectric covering layer 26 is CaF2 with a refractive index of 1.4, and the height h3 of the metal layer is 0.07um. The incident light 21 is visible light with a wavelength of 400nm-700nm and an incident angle of 0 degrees; the substrate 22 is polyester film (PET) with a refractive index of 1.48; the metal layer 24 is aluminum; the dielectric grating 25 is PMMA with a refractive index of 1.48. Other structural parameters of the polarizer are as follows: the thickness of the base is 1000um, the thickness h1 of the high refractive index medium layer is 0.05um, the height of the dielectric grating h2=0.1um, the thickness of the dielectric covering layer h4=0.1um, and the period of the dielectric grating ...

Embodiment 3

[0062] The thickness h4 of the dielectric covering layer in Embodiment 1 is changed, and other parameters remain unchanged. When the incident wavelength is 400nm, the influence of the thickness h4 of the dielectric covering layer on the transmission efficiency and extinction ratio of TM light is as follows: Figure 5 , Image 6 shown. With the increase of h4, the transmission efficiency of TM light changes periodically in the range of 87.0%-91.6%, and the extinction ratio changes periodically in the range of 4.0E4-10.0E4. It can be seen that the dielectric covering layer can modulate the transmission efficiency of the polarizer.

[0063] Considering that the thickness of the dielectric cover layer is too thick, the thickness of the polarizer will be increased, thereby increasing the difficulty of integrating the polarizer with other optical devices. Generally, the thickness of the dielectric cover layer corresponding to the first peak of the transmission efficiency of TM lig...

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Abstract

The invention discloses a sub-wavelength buried type grating structure polaroid sheet which comprises a transparent substrate, a medium grating, a first metal layer and a second metal layer; wherein, the medium grating is provided with ridges and grooves, and the ridges and the grooves are periodically and alternately arranged; the first metal layer is covered on the spines of the medium grating;the second metal grating is covered on the grooves of the medium grating; and the period of the medium grating is smaller than the wavelength of incident light. The polaroid sheet is characterized inthat the upper surfaces of the top parts of the first metal layer and the second metal layer are covered with medium covering layers, a high refractive index medium layer is arranged between the transparent substrate and the medium grating, and the refractive index of the high refractive index medium layer is between the range of 1.6 to 2.4. The medium covering layers can modulate the transmission efficiency of the polaroid sheet as well as protect the metal layers so as to prevent the metal layers from being oxidized and damaged in assembly. The polaroid sheet has high transmission efficiency, high extinction ratio and wide range of incident angles at the whole visible band.

Description

technical field [0001] The invention relates to a polarizer suitable for visible light bands, in particular to a sub-wavelength embedded grating structure polarizer, which can be applied to liquid crystal display, optical communication and other fields. Background technique [0002] Polarizer is a very important optical component in liquid crystal display, optical measurement, optical communication and other systems, and has a very broad market. Polarizers with high extinction ratios, a wide range of incident angles, and very compact volumes are required in these systems. Traditional polarizers are too bulky, have complicated manufacturing processes, and only have a large extinction ratio in a small wavelength range, which can no longer meet the requirements of the display industry for light weight, ultra-thin, and low cost. Therefore, how to design a polarizer with a compact structure, easy processing, and high cost performance has become a research and development trend i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/30G03F7/20
Inventor 周云陈林森叶燕浦东林申溯周小红魏国军解正东
Owner SUZHOU UNIV
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